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Dose metrology for DUV lithographic tools
SPIE Proceedings, 2001The semiconductor industry is investigating metrology methods and tools to ensure the high accuracy and stability required for chip making. Lithography equipment manufacturers are under constant pressure to provide in situ measurements that prevent wafer processing form slipping from the established parameters.
Gregory J. Kivenzor, Richard Zimmerman
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The Light Extraction Efficiency for DUV LEDs
2019DUV LEDs have very low light extraction efficiency (LEE), which is caused by the unique optical polarization and the optically absorptive semiconductor and metal layers. This chapter reviews and analyzes the approaches that have ever been used to improve the LEE.
Zi-Hui Zhang +3 more
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Advances in DUV light source sustainability
SPIE Proceedings, 2017Cymer continues to address several areas of sustainability within the semiconductor industry by reducing or eliminating consumption of power and specific types of gas (i.e. neon, helium) required by DUV light sources in order to function. Additionally, Cymer introduced a new recycling technology to reduce the dependence on production of raw gases. In
Yzzer Roman +10 more
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Experiences in making DUV lithographic objectives
Optical Society of America Annual Meeting, 1992Since only fused silica can be obtained with good enough homogeneity, most lithographic objectives for use below 300 nm are only corrected for very narrow wavelength ranges. As a result these objectives have to be used with wavelength narrowed excimer lasers. By going to catadioptric objectives both high N.A.
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KrF excimer lasers for DUV-lithography
SPIE Proceedings, 1993The paper presents the features of the Lambda Physik 248 LEX KrF DUV-Lithography laser for spectral performance, reliability, and system integration. The 248 LEX is based on Lambda Physik's series of `LAMBDA' industrial lasers. Data of 5 years field experience with the LAMBDA high power industrial lasers are used to discuss reliability of the laser in ...
Rainer Paetzel +2 more
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Optical Coatings for the DUV / VUV
2003During the last two decades, the development of powerful UV light sources, especially excimer lasers and frequency multiplied solid state lasers has lead to growing research efforts in the field of UV photon application. One of the main drivers toward the shortest possible wavelengths in the vacuum ultraviolet spectral region is semiconductor ...
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Improve the Current Spreading for DUV LEDs
2019After the crystalline quality for Al-rich AlGaN layer is significantly improved, it is then the time to design novel DUV LED structures. DUV LEDs are driven electrically which get carrier transport and current injection involved. One of the challenges is the current crowding effect, which easily occurs in the DUV LEDs.
Zi-Hui Zhang +3 more
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Optical coatings for DUV Lithography
Chinese Optics, 2015张立超 ZHANG Li-chao +2 more
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Recent advances of inorganic phosphates with UV/DUV cutoff edge and large second harmonic response
Chinese Journal of Structural Chemistry, 2023Zhaohui Chen
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