Results 101 to 110 of about 723 (223)

Unveiling Time-Dependent Dynamics in MFMIS FeFETs

open access: yesIEEE Journal of the Electron Devices Society
Metal–ferroelectric–metal–insulator–semiconductor (MFMIS) ferroelectric field-effect transistors (FeFETs) using an amorphous indium–tin–zinc-oxide (a-ITZO) channel and Hf ${}_{\mathbf {0.5}}$ Zr ${}_{\mathbf {0.5}
Simin Chen   +6 more
doaj   +1 more source

Physical Insights on Steep Slope FEFETs including Nucleation-Propagation and Charge Trapping

open access: yes, 2019
We present a kinetics-based analysis of the steep slope operation of ferroelectric (FE) FETs built on (i) a statistical multidomain nucleation-propagation mechanism of FE polarization switching and (ii) charge trapping in the high- K FE oxide.
Roussel, P.   +27 more
core   +1 more source

A visible‐to‐infrared miniaturized indium selenide spectrometer enabled by a gate‐tunable spectral response matrix

open access: yesInfoScience, EarlyView.
Traditional light‐analyzing tools, known as spectrometers, are typically too bulky and expensive to fit into portable electronics like smartphones or wearables. In this study, we developed a microscopic, high‐performance spectrometer using a material called Indium Selenide combined with smart algorithms to accurately analyze light from the visible to ...
Jing Chen   +8 more
wiley   +1 more source

MXene‐Based Flexible Memory and Neuromorphic Devices

open access: yesSmall, EarlyView.
The unique two‐dimensional structure, excellent electrical conductivity, and diverse surface groups of MXenes have garnered significant attention. Coupled with their exceptional flexibility, MXene‐based devices hold immense potential for flexible memory and neuromorphic systems. This review comprehensively discusses the fundamentals of flexible devices,
Yan Li   +13 more
wiley   +1 more source

Recent advancements and progress in development of ferroelectric field effect transistor: A review

open access: yesMemories - Materials, Devices, Circuits and Systems
The robust application of ferroelectric materials in various disciplines has resulted in the development of significantly more accurate and potent FeFETs, which have the potential to deliver more promising non-volatile memory and synaptic devices than ...
Mandeep Singh   +3 more
doaj   +1 more source

Memristors Based on Ferroelectric Cu‐Deficient Copper Indium Thiophosphate for Multilevel Storage and Neuromorphic Computing

open access: yesSmall, EarlyView.
Different from CIPS with threshold switching behaviors, Cu‐deficient CIPS* shows stable non‐volatile digital and analog RS. Owing to the formation of metallic IPS at the LRS, CIPS* memristors demonstrate high ON/OFF ratio and endurance stability, which can be utilized to implement multilevel storage.
Mengdie Li   +6 more
wiley   +1 more source

Record High Polarization at 2 V and Imprint‐Free Operation in Superlattice HfO2‐ZrO2 by Proper Tuning of Ferro and Antiferroelectricity

open access: yesAdvanced Materials Technologies, Volume 11, Issue 11, 5 June 2026.
Low‐power ferroelectric capacitors, based on superlattice HfO2‐ZrO2 is reported. With proper tuning of ferro and antiferroelectricity, an imprint‐free high switchable polarization charge (2Pr of 76 µC/cm2) is obtained with 2MV/cm leading to linear analog weight update and non‐volatile retention, providing a design guideline for emerging non‐volatile ...
Xinye Li   +4 more
wiley   +1 more source

Enhanced memory characteristics in organic ferroelectric field-effect transistors through thermal annealing

open access: yesAIP Advances, 2015
We report on the memory characteristics of organic ferroelectric field-effect transistors (FeFETs) using spin-coated poly(vinylidene difluoride/trifluoroethylene) (P(VDF/TrFE)) as a gate insulating layer.
Ryo Sugano   +5 more
doaj   +1 more source

Experimental Analysis and Mathematical Modeling of Program Efficiency in Gate-Side Injection Type FeFETs Depending on the Gate Interlayer

open access: yes
We experimentally analyze the incremental step pulse programming (ISPP) characteristics of gate-side injection type MIFIS FeFETs, which feature a metal - gate interlayer (G.IL) - ferroelectrics - channel interlayer (Ch.IL) - Si stack, with a focus on the
Shin, Seokjoong   +11 more
core   +1 more source

Impact of High-K Deposition Process on the Noise Immunity of FeFETs and their Applicability Towards In-Memory-Computing

open access: yes
This article reports the impact of the high-k material deposition process on the low-frequency noise and reliability of hafnium oxide-based (HfO2) ferroelectric field-effect transistors (FeFET).
Raffel, Yannick   +11 more
core   +1 more source

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