Ferroelectric field‐effect transistors have emerged as promising device platforms for next‐generation electronics due to their ability to combine nonvolatile memory operation with polarization‐controlled modulation of channel conductance. Recent research
Hyeseoung Lee +3 more
doaj +3 more sources
Role of the channel on the memory window of HfZrOx ferroelectric field-effect transistors with p-type Si-doped InZnOx channel [PDF]
To elucidate the origin of the memory window (MW) of HfZrOx ferroelectric field-effect transistors (FeFETs) with a p-type Si-doped InZnOx (p-Si:InZnO) channel, we perform a comparative study with thin-film transistors (TFTs) in which the HfZrOx ...
Hyoungjin Park +4 more
doaj +2 more sources
High‐Mobility and Reliability Ultra‐Thin‐Channel Oxide Semiconductor Field‐Effect Transistors for Chip‐Interconnect‐Embedded Logic and Ferroelectric Memory [PDF]
BEOL‐compatible bilayer heterojunction oxide channel dual‐mode, memory‐logic ferroelectric transistor is fabricated to address long‐standing challenges of mobility and threshold voltage trade‐off by suppressing interfacial defects. This approach not only advances oxide semiconductors toward reliable high‐performance BEOL transistors but also opens new ...
Chun‐Kuei Chen +12 more
wiley +2 more sources
Triple‐Level Content‐Addressable Vertical NAND Flash Memory [PDF]
Commercial triple‐level‐cell V‐NAND flash memory is transformed into a compact content‐addressable memory by directly exploiting its eight threshold‐voltage states. A parity‐split search scheme preserves storage density while enabling reliable multi‐level and don't‐care matching. Parallel word‐line search delivers up to 24‐fold higher throughput and 54.
Sung‐Ho Park +8 more
wiley +2 more sources
Time-Domain Simulation and Optimization of the Memory Window for HZO-Based FeFETs Using the NLS Model [PDF]
Hafnium-zirconium oxide (HZO)-based ferroelectric field-effect transistors (FeFETs) are expected to become core devices for new embedded memory and compute-in-memory systems.
Shangda Han +3 more
doaj +2 more sources
Wake‐Up and Fatigue under Electrical Cycling in HfO2‐Based Ferroelectrics: Mechanisms and Strategies toward Reliable Devices [PDF]
HfO2‐based ferroelectrics exhibit wake‐up and fatigue behaviors during electrical cycling, significantly affecting device endurance and reliability. These phenomena are governed by defect dynamics, including oxygen vacancy redistribution and charge trapping.
Hongseok Kim +6 more
wiley +2 more sources
Low‐Temperature Nanosecond Laser Process of HZO‐IGZO FeFETs toward Monolithic 3D System on Chip Integration [PDF]
Ferroelectric field‐effect transistors (FeFETs) are increasingly important for in‐memory computing and monolithic 3D (M3D) integration in system‐on‐chip (SoC) applications.
Dongsu Kim +8 more
doaj +5 more sources
Ferroelectric transistors (FeFETs)-based crossbar arrays have shown immense promise for computing-in-memory (CiM) architectures targeted for neural accelerator designs.
Chunguang Wang, Sumeet Kumar Gupta
doaj +2 more sources
Ferroelectric Devices for In‐Memory and In‐Sensor Computing [PDF]
Inspired by biological systems, in‐memory and in‐sensor computing overcome von Neumann bottlenecks. Ferroelectric devices can mimic synaptic functions and sense stimuli like light or force, therefore are ideal for these paradigms. This review introduces the ferroelectric devices applied for in‐memory and in‐sensor computing, covering their structures ...
Hong Fang +5 more
wiley +2 more sources
Device-Aware Test for Anomalous Charge Trapping in FeFETs [PDF]
The development of Ferroelectric Field-Effect Transistor (FeFET) manufacturing requires high-quality test solutions, yet research on FeFET testing is still in a nascent stage. To generate a dedicated test method for FeFETs, it is critical to have a deep understanding of manufacturing defects and accurately model them.
Sicong Yuan +10 more
openaire +3 more sources

