Results 51 to 60 of about 2,265 (156)

An organic ferroelectric field effect transistor with poly(vinylidene fluoride-co-trifluoroethylene) nanostripes as gate dielectric

open access: yes, 2014
We demonstrate the fabrication of an organic Ferroelectric Field Effect Transistor (FeFET) incorporating a ferroelectric gate dielectric made of nanostripes obtained by nanoimprinting poly(vinylidene fluoride-co-trifluoroethylene) over a layer of ...
Nysten, Bernard   +19 more
core   +1 more source

Steep switching devices for low power applications: negative differential capacitance/resistance field effect transistors

open access: yesNano Convergence, 2018
Simply including either single ferroelectric oxide layer or threshold selector, we can make conventional field effect transistor to have super steep switching characteristic, i.e., sub-60-mV/decade of subthreshold slope.
Eunah Ko, Jaemin Shin, Changhwan Shin
doaj   +1 more source

Low Voltage Operating 2D MoS2 Ferroelectric Memory Transistor with Hf1-xZrxO2 Gate Structure

open access: yesNanoscale Research Letters, 2020
Ferroelectric field effect transistor (FeFET) emerges as an intriguing non-volatile memory technology due to its promising operating speed and endurance.
Siqing Zhang   +12 more
doaj   +1 more source

Ferroelectric Single-Crystal Gated Graphene/Hexagonal-BN/Ferroelectric Field-Effect Transistor

open access: yes, 2018
The effect of a ferroelectric polarization field on the charge transport in a two-dimensional (2D) material was examined using a graphene monolayer on a hexagonal boron nitride (hBN) field-effect transistor (FET) fabricated using a ferroelectric single ...
Kang, H.   +8 more
core   +1 more source

Interface in a Ferroelectric Field-Effect Transistor

open access: yes, 2023
Characterization of the composition and extension of the SiO$_2$/HfO$_2$ interface in the model systems Si-sub./SiO$_2$ (7.5 nm)/FE:HfO$_2$ (9.5 nm)/TiN (9 nm) for standard impurity concentrations and annealing temperatures (Si 3.6%, 1000 °C; Al 5.5 ...
Bugaev, Aleksandr V.   +9 more
core   +1 more source

Record high room temperature resistance switching in ferroelectric-gated Mott transistors unlocked by interfacial charge engineering

open access: yesNature Communications, 2023
The superior size and power scaling potential of ferroelectric-gated Mott transistors makes them promising building blocks for developing energy-efficient memory and logic applications in the post-Moore’s Law era. The close to metallic carrier density in
Yifei Hao   +8 more
doaj   +1 more source

High‐performance P(VDF‐TrFE)/BaTiO3 nanocomposite based ferroelectric field effect transistor (FeFET) for memory and switching applications

open access: yesNano Select, 2021
The ferroelectric field effect transistor (FeFET) using Poly (vinylidene fluoride‐trifluoroethylene)/Barium titanate [P(VDF‐TrFE)/BaTiO3] polymer nanocomposite as dielectric layer, has been fabricated and characterized.
Uvais Valiyaneerilakkal   +5 more
doaj   +1 more source

A Physics-Based Model for Mobile-Ionic Field-Effect Transistors With Steep Subthreshold Swing

open access: yesIEEE Journal of the Electron Devices Society, 2022
A physics-based model and the corresponding simulation framework for the mobile-ionic field-effect transistor (MIFET) exhibiting the ferroelectric-like behaviors are innovatively proposed based on two-dimensional (2D) Poisson’s equation and non ...
Jiajia Chen   +10 more
doaj   +1 more source

High-performance solution-processed polymer ferroelectric field-effect transistors [PDF]

open access: yes, 2005
We demonstrate a rewritable, non-volatile memory device with flexible plastic active layers deposited from solution. The memory device is a ferroelectric field-effect transistor (FeFET) made with a ferroelectric fluoropolymer and a bisalkoxy-substituted ...
Tanase, C   +11 more
core   +2 more sources

Giant tunnel electroresistance through a Van der Waals junction by external ferroelectric polarization

open access: yesNature Communications
The burgeoning interest in two-dimensional semiconductors stems from their potential as ultrathin platforms for next-generation transistors. Nonetheless, there persist formidable challenges in fully obtaining high-performance complementary logic ...
Guangdi Feng   +16 more
doaj   +1 more source

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