Results 151 to 160 of about 12,503,659 (299)

Bias‐Field Free Single‐Frequency CW‐ODMR of Nitrogen‐Vacancy Centers in Diamond for the Detection of Transient Electrical Signals

open access: yesAdvanced Materials Interfaces, EarlyView.
Simplified quantum sensing technique for the detection of short electrical signals occurring in neuronal signaling or bioinspired technologies. We demonstrate a single frequency continuous‐wave optically detected magnetic resonance (CW‐ODMR) approach to sense signals that can be as short as 0.2 ms.
João Paulo Silva   +4 more
wiley   +1 more source

Label‐Free Detection of a Neurotransmitter Using an Aptamer‐Functionalized Amorphous IGZO Transistor

open access: yesAdvanced Materials Interfaces, EarlyView.
An aptamer‐functionalized amorphous IGZO thin‐film transistor enables label‐free electrical detection of the neurotransmitter serotonin under liquid‐gated operation. Stepwise surface functionalization ensures stable biomolecule integration and efficient electrostatic coupling.
Ngoc Thanh Ho   +3 more
wiley   +1 more source

Van der Waals Chromium Telluride Thin Films Prepared by Hybrid Pulsed Laser Deposition With Tunable Magnetism

open access: yesAdvanced Materials Interfaces, EarlyView.
Epitaxial Cr(1+δ)Te2 thin films were synthesized via hybrid Pulsed Laser Deposition (PLD) that combined Molecular Beam Epitaxy (MBE) techniques with PLD. Control of the Cr intercalation, δ, enabled modulation of magnetic anisotropy, Curie temperature, and transport properties.
Pia Henning   +3 more
wiley   +1 more source

A Reproducible and Scalable Process for High Yield Mesenchymal Stromal Cell Extracellular Vesicles Production

open access: yesAdvanced Materials Technologies, EarlyView.
Mesenchymal stem cell derived extracellular vesicles (MSC‐EVs) are a promising therapeutic tool for regenerative medicine. However, the field lacks a reproducible high‐yield production method to answer the quantities needed for clinical translation.
Christophe Wong   +7 more
wiley   +1 more source

Gate Capacitance of deep submicron MOSFETS with high-K gate dielectrics

open access: yes, 2002
We study gate capacitance of deep submicron MOSFETs with high-K gate dielectrics. Schrödinger’s equation is solved by applying an open boundary condition at silicon-gate dielectric interface.
Haque, A, Hakim, MMA
core  

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