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GaN electronics with high electron mobility transistors
2004 24th International Conference on Microelectronics (IEEE Cat. No.04TH8716), 2004The III-nitrides AlN, GaN, and InN alloys are expected to be basis of a strong development of a novel family of semiconductor devices, for optoelectronics as well as for electronics, GaN-based high electron mobility transistors (HEMTs) have shown superior power handling and operating temperatures at frequency ranges that are beyond the limits of ...
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High electron mobility transistor as electronic flute
Proceedings of ISSE'95 - International Symposium on Signals, Systems and Electronics, 2002We discuss the similarity between the plasma waves in two dimensional systems and sound waves. We show that the behavior of both types of waves is governed by the same equations. Therefore, we may create resonant structures for plasma waves, similar to those in musical instruments, and plasma waves can be excited by a DC current, just like wind musical
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High Electron Mobility Transistor Logic
Japanese Journal of Applied Physics, 1981A high electron mobility transistor (HEMT) logic is described. Ring oscillators with enhancement-mode switching and depletion-mode load HEMTs with a 1.7 µm-gate length have been fabricated to assess logic performance capability. Switching delays down to 56.5 ps at room temperature and down to 17.1 ps at liquid nitrogen temperature have been obtained.
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High Electron Mobility Transistors
2004High Electron Mobility Transistors(HEMTs) [340] are an advanced modification of the simple bulk FET, such as the MEtal Semiconductors Field Effect Transistor (MESFET). Typically, a semiconductor material (barrier) with a comparably wider bandgap is grown on top of a semiconductor material with a higher mobility and comparably lower bandgap.
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The growth of high electron mobility InAsSb for application to high electron-mobility transistors
Journal of Crystal Growth, 2009Abstract High electron mobility and low defect density InAsSb lattice matched to AlSb has been successfully grown on InP substrates by the gas-source molecular beam epitaxy using an AlAsSb/AlSb composite buffer layer structure. The common antimony anion of AlAsSb, AlSb, and InAsSb is believed to effectively improve the film quality of InAsSb and AlSb
Chichih Liao, K.Y. Cheng
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High electron mobility transistors
Surface Science, 1986Abstract Recent developments in selectively doped III–V compound heterostructures for 2DEG systems and high electron mobility transistors (HEMTs) are described.
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