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Optical proximity correction by grey tone photolithography
Microelectronic Engineering, 2000A new approach to optical proximity correction in VLSI photolithography has been proposed. Instead of changing feature dimension or adding serifs, the mask feature itself has been coded in different grey tone levels at different parts of the feature, based on the analysis of aerial image.
Zheng Cui +4 more
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Hybrid optical proximity correction: concepts and results
SPIE Proceedings, 2002Optical Proximity Correction (OPC) is increasingly important in the design and manufacturing of integrated circuits, since many of them now contain features which are smaller than the wavelength of light used in lithography. The optical distortions that beset these subwavelength designs are counteracted through the use of OPC, which strategically ...
Meg Hung, Pratheep Balasingam
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Optical proximity correction considering process latitude
SPIE Proceedings, 1999A two-step OPC approach, that consists of a cell level OPC and a chip level OPC, is proposed. The cell level OPC plays an important role on generating the layout design rules of gate patterns at the initial phase of technology development. The chip level OPC is dedicated to CD adjustment.
Akio Misaka, Shinji Odanaka
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An object-based approach to optical proximity correction
ASICON 2001. 2001 4th International Conference on ASIC Proceedings (Cat. No.01TH8549), 2002As the feature sizes of integrated circuits have been continually reducing to below exposure wavelength, some correcting techniques, such as OPC and PSM are indispensable to compensate for the distortions on wafer images. In this paper, we describe an object-based approach to OPC named OPCM, which is a model-based OPC tool.
null Changqi Yang +4 more
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Benchmarking of software tools for optical proximity correction
SPIE Proceedings, 1998The point when optical proximity correction (OPC) will become a routine procedure for every design is not far away. For such a daily use the requirements for an OPC tool go far beyond the principal functionality of OPC that was proven by a number of approaches and is documented well in literature.
Angelika Jungmann +4 more
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Proximity-effect correction for 3D single-photon optical lithography
Applied Optics, 2015A proximity-effect-correction (PEC) algorithm for three-dimensional (3D) single-photon gray-scale photolithography is proposed and numerically analyzed in this paper. The gray-scale dose assigned to every point within the photoresist volume is optimized to guarantee that the fabricated 3D patterns are as close to the designed patterns as possible.
Xiaowen, Wan, Rajesh, Menon
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Optical Microlithography XVIII, 2005
As design rule is decreased, OPC accuracy has become the crucial factor for achieving stable device functionality and yield. Usually the lithography and the etching process conditions are main parameters impacting to the OPC accuracy. The OPC accuracy can be changed as function of process conditions, even if we use same OPC model.
Jaehyun Kang +4 more
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As design rule is decreased, OPC accuracy has become the crucial factor for achieving stable device functionality and yield. Usually the lithography and the etching process conditions are main parameters impacting to the OPC accuracy. The OPC accuracy can be changed as function of process conditions, even if we use same OPC model.
Jaehyun Kang +4 more
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Reticle defects on optical proximity correction features
SPIE Proceedings, 1998A test mask has been developed and used to characterize automatic defect inspection systems. Characterization was performed on three generations of inspections algorithm and revealed an increase in the detection rate of defects on serifs and jogs with each succeeding algorithm and equipment generation.
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Method for optical proximity correction based on a vector imaging model
Applied OpticsOptical proximity correction (OPC) has become an indispensable step in integrated circuit manufacturing. It requires a huge amount of calculation to obtain a sufficiently accurate OPC model and implement pattern correction. In this paper, the authors proposed an edge-based OPC method built on a vector imaging model, where ...
Ruixuan, Wu, Lisong, Dong, Yayi, Wei
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Optical proximity correction with the conditional Wasserstein GAN
DTCO and Computational Patterning II, 2023Pengpeng Yuan, Peng Xu, Yayi Wei
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