Single-Crystalline Si Stacked AlGaN/GaN High-Electron-Mobility Transistors with Enhanced Two-Dimensional Electron Gas Density. [PDF]
Ham G +6 more
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Effects of Carrier Trapping and Noise in Triangular-Shaped GaN Nanowire Wrap-Gate Transistor. [PDF]
Mallem SPR +9 more
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Advances in High-Voltage Power Electronics Using Ga<sub>2</sub>O<sub>3</sub>-Based HEMT: Modeling. [PDF]
Alhasani R +4 more
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High Power Density X-Band GaN-on-Si HEMTs with 10.2 W/mm Used by Low Parasitic Gold-Free Ohmic Contact. [PDF]
Du J +12 more
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Path planning for UAVs in complex terrain based on the PGD model: Algorithmic improvements combining feature extraction and reinforcement learning. [PDF]
Liu L, Li X, Meng L, Zhao Y, Lv Y.
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p-GaN source integrated GaN/AlGaN/GaN double heterojunction field-effect transistor (FET) for next-generation electronic applications. [PDF]
Kumar M +5 more
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Design and Application of p-AlGaN Short Period Superlattice. [PDF]
Liu Y +6 more
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p-GaN Gate HEMTs With Tungsten Gate Metal for High Threshold Voltage and Low Gate Current
IEEE Electron Device Letters, 2013The impact of gate metals on the threshold voltage (VTH) and the gate current of p-GaN gate high-electron-mobility transistors (HEMTs) is investigated by fabricating p-GaN gate HEMTs with different work function gate metals-Ni and W. p-GaN gate HEMTs incorporate a p-GaN layer under the gate electrode as the gate stack on top of the AlGaN/GaN layer.
Injun Hwang, Jongseob Kim, Jaikwang Shin
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