Results 91 to 100 of about 23,511 (291)

Oxygen‐Tunnel Indium Tin Oxide Vertical Channel Transistors with Enhanced Current Density and Reliability for Monolithic 3D Compute‐In‐Memory Systems

Advanced Functional Materials, EarlyView.
Oxygen‐tunnel (OT) indium tin oxide (ITO) vertical channel transistors (VCTs) enable reliable, high‐density gain‐cell memory for monolithic 3D integration. A sandwiched SiN/SiO2/SiN OT stack selectively regulates oxygen transport, suppressing parasitic electrode oxidation while stabilizing channel oxygen vacancies, thereby suppressing carrier injection
Hyeonho Gu, Haksoon Jung, Yongwoo Lee, Hoichang Jeong, Yanfeng Zhao, Heesoo Yang, Minho Park, Hyeonjin Lee, Seunghun Baek, Minju Song, Junghwan Kim, Youngmin Jo, Hyunjin Park, Munhyeon Kim, Jae‐Joon Kim, Kyuho Jason Lee, Byungjo Kim, Jimin Kwon   +17 more
wiley   +1 more source

Plasma atomic layer deposition

, 2020
Plasma atomic layer deposition (ALD) is optimized through modulation of the gas residence time during an excited species phase, wherein activated reactant is supplied such as from a plasma.

core  

Thermal and plasma enhanced atomic layer deposition of Al2O3on GaAs substrates [PDF]

, 2009
A good dielectric layer on the GaAs substrate is one of the critical issues to be solved for introducing GaAs as a candidate to replace Si in semiconductor processing.
Sioncke, S., Kessels, WMM Erwin, Delabie, Annelies, Delabie, A, Brammertz, Guy, Meuris, M, Sioncke, Sonja, Heyns, MM, Heyns, Marc, van Hemmen, J.L., Franquet, A, Conard, Thierry, Urbanczyk, A.J., Meuris, Marc, Urbanzcyk, Adam, Caymax, Matty, Sioncke, S, Meuris, M., Franquet, Alexis, Caymax, M, Caymax, M., Brammertz, G., Kessels, W.MM., Delabie, A., Hemmen, van, J.L., Urbanczyk, AJ Adam, Keuning, W Wytze, Franquet, A., Heyns, M.M., Brammertz, G, Conard, T, Hemmen, JL Hans van, Kessels, W.M.M., Conard, T., Keuning, W.   +34 more
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Multimodal Soft Surgical Robots Enabled by Eco‐Degradable, Sterilizable Polymers and Transient Electronics

Advanced Functional Materials, EarlyView.
A compostable PGS soft surgical robot with interchangeable modules integrates transient Mo tactile and Si thermal sensors for dual feedback. The device preserves its function after clinical‐grade sterilization, demonstrates stable actuation and cardiac tissue grasping with real‐time in vivo pulsatile monitoring, and biodegrades post‐use with soil‐safe, 
Minseong Chae, Kyung‐Sub Kim, Gyeong‐Seok Hwang, Jun‐Seok Shim, Sung‐Woo Kim, Yong‐Wu Kim, Jieun Han, Jae‐Young Bae, Jae‐Hwan Lee, Minjung Chae, Jooik Jeon, Joo‐Hyeon Park, You‐Jung Park, Ju‐Yong Lee, Sung‐Geun Choi, Min‐Ha Oh, Yong‐Joong Shin, Young‐In Ryu, Ji‐Woo Gu, Seong‐Yu Choi, Jeong‐Yun Sun, Jung Keun Hyun, Myoung‐Ryul Ok, Sang Yup Kim, Edyta Wyszkowska, Ju‐Young Kim, Kang‐Sik Lee, Seung‐Kyun Kang   +27 more
wiley   +1 more source

Plasma-enhanced atomic layer deposition of Al2O3 on graphene via an in situ-deposited interlayer

Materials Science in Semiconductor Processing
Published by Elsevier Science, Amsterdam [u.a.]
Riazimehr, Sarah, Esteki, Ardeshir, Otto, Martin, Powell, Michael, Rinke, Gordon, Robertz, Bianca, Wang, Zhenxing, Lemme, Max C., Hore, Katie, Knoops, Harm   +9 more
openaire   +2 more sources

Production of carbon nanotubes by PECVD and their applications to supercapacitors

, 2010
Màster en Nanociència i NanotecnologiaPlasma enhanced chemical vapor deposition (PECVD) is a versatile technique to obtain vertically dense-aligned carbon nanotubes (CNTs) at lower temperatures than chemical vapor deposition (CVD).
Caglar, Burak
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Ion energy control during plasma-enhanced atomic layer deposition: enabling materials control and selective processing in the third dimension [PDF]

, 2019
As we enter an era of atomic scale devices, there is a strict need for precise control over the thickness and properties of materials em-ployed in device fabrication [1,2].
Knoops, Harm, Knoops, Harm; id_orcid, Faraz, Tahsin, Kessels, Erwin   +3 more
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Surface chemistry of plasma-assisted atomic layer deposition of Al2O3 studied by infrared spectroscopy [PDF]

, 2008
The surface groups created during plasma-assisted atomic layer deposition (ALD) of Al2O3 were studied by infrared spectroscopy. For temperatures in the range of 25–150 °C, –CH3 and –OH were unveiled as dominant surface groups after the Al(CH3)3precursor ...
Sanden, MCM Richard van de, Keijmel, J Jeroen, Kessels, WMM Erwin, Langereis, E., Sanden, van de, M.C.M., W. M. M. Kessels, Langereis, E Erik, M. C. M. van de Sanden, Kessels, W.M.M., E. Langereis, Keijmel, J., J. Keijmel   +11 more
core   +1 more source

Omnipolar Magnetic Field Detection by Superlattice‐Based Hall Sensor

Advanced Functional Materials, EarlyView.
Magnetic‐field‐induced electronic switching is demonstrated in unit‐cell‐engineered La0.7Sr0.3MnO3–BiFeO3 superlattices. Distinct substrate terminations modify magnetic and transport properties. Hall resistance measurements show omnipolar, hysteretic anomalous Hall switching above the Curie temperature, arising from Fe─Mn interfacial exchange, enabling
Mark Huijben, Nicolas Gauquelin, Arno Annys, Zhaoliang Liao, Jo Verbeeck, Guus Rijnders, Gertjan Koster   +6 more
wiley   +1 more source

Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition [PDF]

ECS Meeting Abstracts, 2006
Abstract not Available.
Sun Jin Yun, Jung Wook Lim, Jin Ho Lee
openaire   +1 more source