Results 101 to 110 of about 5,812,653 (293)

Advances in Solution‐Processed Textile Triboelectric Nanogenerators: Ink Formation, Processing Strategies, Applications, and Challenges

Advanced Functional Materials, EarlyView.
Advanced ink systems for solution‐processed textile triboelectric nanogenerators are systematically summarized, spanning conductive, tribo‐negative, and tribo‐positive layers. By connecting ink chemistry, deposition methods, and device function, the present review reveals the key governing principles of solution development and highlights practical ...
Xinlong Sun, Stephen Beeby
wiley   +1 more source

Plasma-enhanced atomic layer deposition of Al2O3 on graphene via an in situ-deposited interlayer

Materials Science in Semiconductor Processing
Published by Elsevier Science, Amsterdam [u.a.]
Riazimehr, Sarah, Esteki, Ardeshir, Otto, Martin, Powell, Michael, Rinke, Gordon, Robertz, Bianca, Wang, Zhenxing, Lemme, Max C., Hore, Katie, Knoops, Harm   +9 more
openaire   +2 more sources

A Holistic Platform Approach for Developing Robust Pulmonary mRNA Delivery: Integrating Novel Phenolic Acid‐Derived Ionizable Lipids and Device Engineering

Advanced Functional Materials, EarlyView.
An integrated pulmonary mRNA delivery platform combining novel biodegradable syringic acid‐derived ionizable lipids, design‐of‐experiments formulation optimization, and vibrating‐mesh nebulizer engineering enabled stable aerosolization and efficient lung delivery.
Neha Kaushal, Younan Ma, Asad Khanmohammed, Dipen Parande, Hanming Zhang, Saket Dolare, Juliet Chen, Apiwat Wangweerawong, Saswata Karmakar, Hongfeng Deng, Frank Koppenhagen, Shraddha Sharma, Eric Reyes, Sherry He, Lianne Boeglin, Caroline Woo, Azadeh Paksa, Ayed Allawzi, Anusha Dias, Gregory Troiano, Shrirang Karve, Frank DeRosa   +21 more
wiley   +1 more source

Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma [PDF]

, 2018
The growth of tungsten oxide (WO3) thin films by atomic layer deposition (ALD) offers numerous merits including atomic-scale thickness control at low deposition temperatures.
Bol, AA Ageeth, Kessels, WMM Erwin, Balasubramanyam, S, Sharma, A Akhil, Balasubramanyam, S., Vandalon, V., Vandalon, V Vincent, Bol, A.A., Knoops, H.C.M.; id_orcid, Knoops, H.C.M., Sharma, A., Knoops, HCM Harm, Kessels, W.M.M.   +12 more
core   +4 more sources

Designing Vanadium‐Based Oxide Electrocatalysts for Water Splitting: Experimental and Mechanistic Insights with Machine Learning

Advanced Functional Materials, EarlyView.
This review establishes structure‐property‐mechanism relationships across six modification strategies for V‐based oxide water‐splitting electrocatalysts: lattice engineering, heteroatom doping, interface engineering, carbon‐based hybridization, morphology engineering, and surface reconstruction and pre‐catalyst design, where dissolution is reframed as ...
Youness El Issmaeli, Amina Lahrichi, Hoje Chun, Rafael Gómez‐Bombarelli, Bruno G. Pollet   +4 more
wiley   +1 more source

Towards Plasma Enhanced Atomic Layer Deposition

, 2023
The fabrication of microelectronics relies on thin film technologies. As the demand for improved performance of microchips continues to escalate, atomic layer deposition (ALD) has emerged as a crucial technique in enabling precise and controlled thin ...
Jen, Wesley, KC, Sivagya, Graugnard, Elton, Hues, Steven   +3 more
core  

Architecture‐Driven Functional Coupling in Vertically Aligned Nanocomposites

Advanced Functional Materials, EarlyView.
Vertically aligned nanocomposites define a growth‐engineered architecture in which vertical interfaces, strain fields, defect pathways, and phase connectivity are created simultaneously. This review shows how these architectural features couple ferroic, optical, ionic, electrochemical, and device responses, establishing design rules and open challenges
Md Shatil Islam‐Shanto, Javier Zamudio‐García, Abraham Sánchez‐Caballero, David Marrero‐López, Vincenzo Esposito   +4 more
wiley   +1 more source

Low-temperature synthesis of gallium nitride thin films using plasma-enhanced atomic layer deposition for nanoelectronics [PDF]

APL Materials
In this paper, we report on the low-temperature synthesis of gallium nitride (GaN) thin films using plasma-enhanced atomic layer deposition and fabrication of AlN/GaN field-effect transistors for the application of microelectronics.
Zhigang Xiao, Baraka Chimba, Ibraheem Giwa, Fabian Sanchez, Kim Kisslinger, Fernando Camino, Dmytro Nykypanchuk, Xiao Tong   +7 more
doaj   +1 more source

Amphoteric Cu‐Doping Leading to High Thermoelectric Performance in p‐Type Bismuth Antimony Telluride

Advanced Functional Materials, EarlyView.
This study shows that Cu plays two opposite roles in p‐type Bi0.5Sb1.5Te3 depending on the processing route. Under thermodynamic‐equilibrium bulk‐synthesis, Cu mainly occupies cation sites, increases hole concentration, preserves mobility, and slightly reduces lattice heat transport. The best‐performing composition among the investigated series reaches
Moritz Thiem, Zhiyuan Li, Minsu Heo, Fangyi Hu, Tian Lan, Youngdeog Koh, Ruiwen Xie, Chuanmu Tian, Marc Widenmeyer, Hyun‐Sik Kim, Jan P. Hofmann, Yuan Yu, Hongbin Zhang, Anke Weidenkaff, G. Jeffrey Snyder, Wenjie Xie   +15 more
wiley   +1 more source

Room-temperature atomic layer deposition of platinum

, 2013
Plasma-assisted atomic layer deposition (ALD) processes were developed for the deposition of platinum films at room temperature. High-quality, virtually pure films with a resistivity of 18–24 µO cm were obtained for processes consisting of MeCpPtMe3 ...
Bol, AA Ageeth, Kessels, WMM Erwin, Bol, A.A., Mackus, A.J.M., Knoops, H.C.M.; id_orcid, Garcia-Alonso Garcia, D Diana, Garcia-Alonso Garcia, D., Knoops, H.C.M., Mackus, AJM Adrie, Knoops, HCM Harm, Kessels, W.M.M.   +10 more
core   +1 more source