Results 101 to 110 of about 23,511 (291)
Towards Plasma Enhanced Atomic Layer Deposition
The fabrication of microelectronics relies on thin film technologies. As the demand for improved performance of microchips continues to escalate, atomic layer deposition (ALD) has emerged as a crucial technique in enabling precise and controlled thin ...
Jen, Wesley +3 more
core
Conventional doping of P3HT with F4TCNQ results in poor charge transport. However, when F4TCNQ is exchanged with LiTFSI, the transport characteristics are greatly enhanced. We find the increase in charge transport is directly related to an increase in the mesoscale ordering of P3HT, resulting in longer and better‐connected transport pathways.
Quynh M. Duong +9 more
wiley +1 more source
This study demonstrates that memristors can replace conventional 2T–1C driving circuits with simplified 1T–1 m architectures by exploiting resistance switching. With ultra‐low switching voltages (< ±0.2 V) and multi‐level resistance states, the memristors precisely control the current injected into organic light‐emitting diodes (OLEDs).
Dong Hyun Kim +6 more
wiley +1 more source
Plasma-enhanced atomic layer deposition (ALD) is a common method for fabricating Hf0.5Zr0.5O2 (HZO) ferroelectric thin films that can be performed using direct-plasma (DP) and remote-plasma (RP) methods.
Won-Ji Park +6 more
doaj +1 more source
Growth and chemical characterisation studies of Mn silicate barrier layers on SiO2 and CDO [PDF]
This thesis investigates the suitability of manganese silicate (MnSiO3) as a possible copper interconnect diffusion barrier layer on both a 5.4 nm thick thermally grown SiO2 and a low dielectric constant carbon doped oxide (CDO), with the focus of ...
Bogan, Justin
core
Energy-enhanced atomic layer deposition : offering more processing freedom
Atomic layer deposition (ALD) is a popular deposition technique comprising two or more sequential, self-limiting surface reactions, which make up an ALD cycle.
Potts, SE Stephen +5 more
core +1 more source
Plasma-enhanced atomic layer deposition of tungsten oxide thin films using (tBuN)2(Me2N)2W and O2 plasma [PDF]
The growth of tungsten oxide (WO3) thin films by atomic layer deposition (ALD) offers numerous merits including atomic-scale thickness control at low deposition temperatures.
Bol, AA Ageeth +12 more
core +1 more source
Cyclic Olefin Copolymers as Versatile Materials for Advanced Engineering Applications
Cyclic olefin copolymers (COCs) are presented as highly versatile materials combining tunable synthesis, excellent optical properties, and mechanical robustness. Their potential spans microfluidics, bioengineering, and advanced electronics, while emerging self‐healing and sustainable solutions highlight future opportunities.
Giulia Fredi +3 more
wiley +1 more source
Studies on enhanced OLED performance using Al2O3 buffer layer by atomic layer deposition
It has been found that introduction of buffer layers between organic holes transport layer and anode layer plays an important role in improving device stability and hole injection efficiency.
Z. Cui(崔铮) +2 more
core
Defect Detection in Thin-film Photovoltaics; Towards Improved Efficiency and Longevity [PDF]
The photovoltaic (PV) industry is seeking to increase efficiency and functional lifetime of PV modules manufactured on polymer substrates. High resolution and high speed surface inspection for the quality control of the manufacture of large area flexible
Robbins, David +15 more
core +1 more source

