Results 81 to 90 of about 95,287 (194)

Production of carbon nanotubes by PECVD and their applications to supercapacitors

open access: yes, 2010
Màster en Nanociència i NanotecnologiaPlasma enhanced chemical vapor deposition (PECVD) is a versatile technique to obtain vertically dense-aligned carbon nanotubes (CNTs) at lower temperatures than chemical vapor deposition (CVD).
Caglar, Burak
core   +1 more source

Elemental distribution and oxygen deficiency of magnetron sputtered ITO films

open access: yes, 2011
The atomic structure and composition of non-interfacial ITO and ITO-Si interfaces were studied with Transmission Electron Microscopy (TEM) and X-ray Photoelectron Spectroscopy (XPS). The films were deposited by DC magnetron sputtering on mono-crystalline
Diplas, Spyros   +4 more
core   +1 more source

Nanoroughness, Surface Chemistry and Drug Delivery Control by Atmospheric Plasma Jet on Implantable Devices [PDF]

open access: yes, 2018
Implantable devices need specific tailored surface morphologies and chemistries to interact with the living systems or to actively induce a biological response also by the release of drugs or proteins.
Ambrosi, Emmanuele   +8 more
core   +3 more sources

Characterization of HZO Films Fabricated by Co-Plasma Atomic Layer Deposition for Ferroelectric Memory Applications

open access: yesNanomaterials
Plasma-enhanced atomic layer deposition (ALD) is a common method for fabricating Hf0.5Zr0.5O2 (HZO) ferroelectric thin films that can be performed using direct-plasma (DP) and remote-plasma (RP) methods.
Won-Ji Park   +6 more
doaj   +1 more source

Investigation of ultra-thin Al₂O₃ film as Cu diffusion barrier on low-k (k=2.5) dielectrics [PDF]

open access: yes, 2011
Ultrathin Al(2)O(3) films were deposited by PEALD as Cu diffusion barrier on low-k (k=2.5) material. The thermal stability and electrical properties of the Cu/low k system with Al(2)O(3) layers with different thickness were studied after annealing.
Chen, Fei   +8 more
core   +1 more source

Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants [PDF]

open access: yes
The growth mechanisms and film properties of atomic layer deposition (ALD) Ta-based thin films were investigated from alkylamide precursor [Ta(NMe2)(5), (PDMAT)].
Kim, H, Maeng, WJ, Park, SJ
core   +1 more source

Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings

open access: yesNanomaterials, 2017
Plasma enhanced atomic layer deposition (PEALD) of silver nanoparticles on the surface of 1-D titania coatings, such as nanotubes (TNT) and nanoneedles (TNN), has been carried out.
Aleksandra Radtke   +8 more
doaj   +1 more source

Plasma Nanoscience: from Nano-Solids in Plasmas to Nano-Plasmas in Solids

open access: yes, 2013
The unique plasma-specific features and physical phenomena in the organization of nanoscale solid-state systems in a broad range of elemental composition, structure, and dimensionality are critically reviewed.
Meyyappan, M.   +2 more
core   +2 more sources

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