Results 11 to 20 of about 5,793,946 (166)

Plasma-Enhanced Atomic Layer Deposition (PEALD) of TiN using the Organic Precursor Tetrakis(ethylmethylamido)Titanium (TEMAT) [PDF]

MATEC Web of Conferences, 2016
This paper presents the plasma-enhanced atomic layer deposition (PEALD) of titanium nitride (TiN) using the organic precursor tetrakis(ethylmethylamido)titanium (TEMAT), with remote ammonia (NH3) plasma as reactant gas.
Chen Z.X., Li X., Li W.-M., Lo G.-Q.
doaj   +3 more sources

Plasma-Enhanced Atomic Layer Deposition-Based Ferroelectric Field-Effect Transistors

IEEE Journal of the Electron Devices Society
The use of the plasma-enhanced atomic layer deposition (ALD) technique for the deposition of HfO2-based ferroelectrics has received attention in recent years primarily due to wake-up free operation.
Chinsung Park, Prasanna Venkat Ravindran, Dipjyoti Das, Priyankka Gundlapudi Ravikumar, Chengyang Zhang, Nashrah Afroze, Lance Fernandes, Yu Hsin Kuo, Jae Hur, Hang Chen, Mengkun Tian, Winston Chern, Shimeng Yu, Asif Islam Khan   +13 more
doaj   +2 more sources

Plasma-Enhanced Atomic Layer Deposition of AlF₃ Antireflective Coatings via Pulse-Time Control of Fluorine Radical Reactions [PDF]

Nanomaterials
Plasma-enhanced atomic layer deposition (PEALD) is used to grow high-quality aluminum fluoride (AlF3) antireflective coatings via a safe, HF-free route using trimethylaluminum and SF6 plasma.
Jing Zhang, Zhixuan Zhang, Chia-Hsun Hsu, Peng Gao, Yu Qiu, Yuqi Lin, Shui-Yang Lien   +6 more
doaj   +2 more sources

Insights into ALD Growth of Al-Based Dielectric Stack on 4H-SiC [PDF]

Nanomaterials
An Al2O3/AlN stack deposited via Atomic Layer Deposition (ALD) methods as a gate insulator for silicon carbide (4H-SiC) has been investigated, focusing on the effects of different Al2O3 deposition processes on the nitride layer. In particular, dielectric
Bruno Galizia, Emanuela Schilirò, Patrick Fiorenza, Filippo Giannazzo, Bela Pecz, Zsolt Fogarassy, Fabrizio Roccaforte, Raffaella Lo Nigro   +7 more
doaj   +2 more sources

Coexisting Volatile and Nonvolatile Switching in 3D ALD‐IGZO Vertical RRAM for Fully Hardware‐Based Wide Reservoir Computing [PDF]

Advanced Science, EarlyView.
A conformal ALD‐IGZO vertical RRAM integrates volatile and nonvolatile switching within a compact 2F architecture. Before forming, tunable volatile dynamics provide fading‐memory reservoir states, while after forming, stable multilevel conductance modulation enables hardware readout.
Seeun Lee, Jaewon Park, Nawoon Kim, Seohyeon Ju, Seong‐Cheol Jang, Hyun‐Suk Kim, Sungjun Kim   +6 more
wiley   +2 more sources

Phase Engineering of Plasma‐Enhanced Atomic Layer Deposited Molybdenum Disulfide Using High Accuracy Direct Writing With Focused Li+ and Ga+ Ion Beams and Ultrashort Pulse Laser [PDF]

Small, Volume 22, Issue 53, 21 September 2026.
In the context of phase heterostructures on two‐dimensional materials, a high‐precision direct writing approach is employed. This involves using a focused ion beam to transform molybdenum disulfide to the metallic 1T phase, followed by retransformation via ultrashort pulse laser processing.
Marvin Krüner, Achim Nadzeyka, Malte Jonas Marius Julian Becher, Zhongquan Liao, Detlef Rogalla, André Clausner, Andreas Ostendorf, Michael Kahl, Claudia Bock   +8 more
wiley   +2 more sources

Influence of deposition conditions on ALD based Ru passivation for Cu-Cu hybrid bonding [PDF]

Scientific Reports
Cu-Cu hybrid bonding is a key technology for fine-pitch interconnections in advanced semiconductor packaging. However, native Cu oxidation and interface instability hinder reliable low-temperature bonding.
Sang Woo Park, Hee Han, Chi Won Ahn, Jong Kyung Park   +3 more
doaj   +2 more sources

Biointegrated Multilayer Stretchable OLED Platform With Strain‐Decoupled Architecture for Durable Phototherapeutic Applications [PDF]

Advanced Science, Volume 13, Issue 51, 14 September 2026.
A multilayer stretchable organic light‐emitting diode (SOLED) patch enables conformal, high‐fill‐factor phototherapeutic illumination through vertically decoupled electrodes and robust encapsulation. The textile‐based SOLED platform delivers stable skin‐contact red light for wearable phototherapy and 5‐aminolevulinic acid (ALA)‐mediated photodynamic ...
Young Hyun Son, Myeongheon Lee, Jun‐Yeop Song, Hyo‐Jung Kwon, Kyung Cheol Choi, Jeong Hyun Kwon   +5 more
wiley   +2 more sources

Relation Between Thickness and TFTs Properties of HfO₂ Dielectric Layer Synthesized by Plasma-Enhanced Atomic Layer Deposition [PDF]

Nanomaterials
The advancement of portable high-definition organic light-emitting diode (OLED) displays necessitates thin film transistors (TFTs) with low power consumption and high pixel density.
Qizhen Chen, Wanqiang Fu, Jing Han, Xiaoying Zhang, Shui-Yang Lien   +4 more
doaj   +2 more sources

Low Resistivity and High Carrier Concentration in SnO₂ Thin Films: The Impact of Nitrogen–Hydrogen Annealing Treatments [PDF]

Nanomaterials
The tin dioxide (SnO2) thin films in this work were prepared by using plasma-enhanced atomic layer deposition (PEALD), and a systematic analysis was conducted to evaluate the influence of post-deposition annealing at various temperatures in a nitrogen ...
Qi-Zhen Chen, Zhi-Xuan Zhang, Wan-Qiang Fu, Jing-Ru Duan, Yu-Xin Yang, Chao-Nan Chen, Shui-Yang Lien   +6 more
doaj   +2 more sources