Results 21 to 30 of about 5,793,946 (166)
Development of an innovative low-temperature PEALD process for stress-compensated TiO2 and SiO2 multilayer anti-reflective coatings [PDF]
This study presents a low-temperature plasma-enhanced atomic layer deposition (PEALD) technique for fabricating high-performance, stress-reduced anti-reflective coatings (ARCs).
Duy Thanh Cu +5 more
doaj +2 more sources
Tailoring Performance of the LiNi0.8Mn0.1Co0.1O2 Cathode by Al2O3 and MoO3 artificial cathode electrolyte interphase (CEI) layers through plasma-enhanced atomic layer deposition (PEALD) Coating [PDF]
The Ni-rich layered oxide cathode conceptus has shown high energy density, proper rate capability, and longevity of the rechargeable battery, while poor stability and capacity fading are assumed as its common cons.
Seyedeh , Banitaba +6 more
core +1 more source
Self-limiting Nitrogen/Hydrogen Plasma Radical Chemistry in Plasma-Enhanced Atomic Layer Deposition of Cobalt [PDF]
Cobalt (Co) is a potential candidate in replacing copper for interconnects and has been applied in the trenches in semiconductor industry over twenty years.
Ji, Liu +3 more
core +1 more source
Plasma-Enhanced Molecular Layer Deposition of Phosphane-ene Polymer Films [PDF]
A vapour phase molecular layer deposition (MLD) process generating phosphorus-rich phosphane-ene polymer networks was adapted from known solution phase methods and successfully used in a commercial atomic layer deposition tool.
Christine, McGuiness +6 more
core +1 more source
International audienceIn this work, we focus on the development of topographically selective deposition (TSD) leading to local deposition on the vertical sidewalls of 3D structures. A proof of concept is provided for the TSD of Ta2O5.
Rémy Gassilloud +13 more
core +1 more source
Atomic layer deposition (ALD) has been identified as a promising growth method for high-uniformity superconducting thin films for superconducting quantum photonic applications, offering superior uniformity, thickness control and conformality to ...
C T Lennon +8 more
doaj +1 more source
InN thin films were grown on Si(1 0 0) substrates by plasma-enhanced atomic layer deposition (PEALD). In this work, It is found that the island growth of InN on Si(1 0 0) easily happens at the initial PEALD period.
Yunlai An +9 more
doaj +1 more source
Production of carbon nanotubes by PECVD and their applications to supercapacitors [PDF]
Màster en Nanociència i NanotecnologiaPlasma enhanced chemical vapor deposition (PECVD) is a versatile technique to obtain vertically dense-aligned carbon nanotubes (CNTs) at lower temperatures than chemical vapor deposition (CVD).
Caglar, Burak
core +6 more sources
We studied the tuning of structural and optical properties of ZnO thin film and its correlation to the efficiency of inverted solar cell using plasma-enhanced atomic layer deposition (PEALD).
Mi-jin Jin +5 more
doaj +1 more source
High crystalline epitaxial thin films of NiO by plasma-enhanced ALD and their properties
NiO is an interesting transition metal oxide due to its fascinating properties. High crystalline thin films of NiO are preferred for use in a variety of device applications but are challenging to deposit at low temperatures.
Rohit Attri +3 more
doaj +1 more source

