Results 241 to 250 of about 24,132 (263)

Role of N2 addition on CF4/O2 remote plasma chemical dry etching of polycrystalline silicon Available to Purchase

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 1997
Gottlieb S Oehrlein, P J Matsuo
exaly  

Chemical dry etching of silicon oxide in F/Ar remote plasmas

Thin Solid Films, 2007
N ‐E Lee, D J Kim
exaly  

Polysilicon gate etching in high density plasmas. V. Comparison between quantitative chemical analysis of photoresist and oxide masked polysilicon gates etched in HBr/Cl2/O2 plasmas Available to Purchase

Journal of Vacuum Science & Technology B, 1997
O Joubert
exaly  

Chemical gases sensing properties of diamond nanocone arrays formed by plasma etching

Journal of Applied Physics, 2007
C Z Gu, S Y Fu, J J Li
exaly  

PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION AND ETCHING

2008
openaire   +1 more source

In-Line Plasma-Chemical Etching of Crystalline Silicon Solar Wafers at Atmospheric Pressure

IEEE Transactions on Plasma Science, 2009
Stefan Kaskel, Matthias Leistner, Eckhard Beyer   +2 more
exaly  

Plasma-Assisted Chemical Etching (PACE)

2016
openaire   +1 more source

Ultrahigh-rate plasma jet chemical etching of silicon Available to Purchase

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 2001
A Schindler
exaly  

Development of Process for Fast Plasma-Chemical Through Etching of Single-Crystal Quartz in SF6/O2 Gas Mixture

Russian Journal of Applied Chemistry, 2018
Artem Osipov, S E Aleksandrov
exaly  

Analysis of the chemical composition and deposition mechanism of the SiOx–Cly layer on the plasma chamber walls during silicon gate etching Available to Purchase

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 2004
Nader Sadeghi
exaly