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Plasma-induced chemical etching generating Ni3S2 for formaldehyde detection
Chinese Chemical Letters, 2022Xiaoli Xiong
exaly
Effects of ion bombardment and chemical reaction on wafer temperature during plasma etching
Journal of Applied Physics, 1990Pelletier J, Joubert O
exaly
Role of N2 addition on CF4/O2 remote plasma chemical dry etching of polycrystalline silicon
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 1997Gottlieb Oehrlein, Oehrlein G S
exaly
Texturing of multicrystalline silicon with acidic wet chemical etching and plasma etching
2003Schultz, O. +3 more
openaire +1 more source
In-Line Plasma-Chemical Etching of Crystalline Silicon Solar Wafers at Atmospheric Pressure
IEEE Transactions on Plasma Science, 2009Stefan Kaskel +2 more
exaly

