Results 241 to 250 of about 22,855 (262)
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Role of N2 addition on CF4/O2 remote plasma chemical dry etching of polycrystalline silicon

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 1997
Gottlieb Oehrlein, Oehrlein G S
exaly  

In-Line Plasma-Chemical Etching of Crystalline Silicon Solar Wafers at Atmospheric Pressure

IEEE Transactions on Plasma Science, 2009
Stefan Kaskel   +2 more
exaly  

Development of Process for Fast Plasma-Chemical Through Etching of Single-Crystal Quartz in SF6/O2 Gas Mixture

Russian Journal of Applied Chemistry, 2018
Artem Osipov   +2 more
exaly  

Simulations of Si and SiO2 etching in SF6+O2 plasma

Vacuum, 2009
Rimantas Knizikevičius
exaly  

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