Results 231 to 240 of about 22,855 (262)

Features of plasma chemical etching of lithium tantalate substrate (LiTaO???)

2023
The results of researches of plasma chemical treatment of lithium monocrystalline tantalate (LiTaO???) from gas type, bias voltage (energy of chemically active ions) and from current of additional bias generator are given. A closed-loop electron drift plasma chemical reactor and gas mixtures containing Ar, Ar + Cl?????, and Ar + SF??? were used for the
Fedorovich, O.A., Hladkovska, O.V., Hladkovskyi, V.V., Nedybaliuk, A.F.   +3 more
openaire   +1 more source

PLASMA-CHEMICAL ETCHING OF SILICON DIOXIDE FILMS

Radio communication technology, 2019
V. N. Zima, A. N. Kuznetsov, S. A. Kuznetsova   +2 more
openaire   +1 more source

Experimental research of ICP reactor for plasma-chemical etching

2015
The results of systematic experimental researches of plasma-chemical etching reactor in the inductive mode are presented in this paper. Measurements of the integral discharge parameters (inductor voltage, gas pressure, input power) have been carried out as well as probe measurements of spatial distribution of local plasma parameters (plasma density ...
Dudin, S.V., Zykov, A.V., Dahov, A.N., Farenik, V.I.   +3 more
openaire   +1 more source

The “Plasma-chemical etching” Virtual Lab

2013
Zaitsev, Alexander, Baburov, Vitaliy
openaire   +1 more source

Surface Chemical Reactions of Etch Stop Prevention in Plasma-Enhanced Atomic Layer Etching of Silicon Nitride

Surface and Coatings Technology, 2023
Jomar U. Tercero, Akiko Hirata, Michiro Isobe, Kazuhiro Karahashi, Masanaga Fukasawa, Satoshi Hamaguchi   +5 more
openaire   +1 more source

Chemical reactions responsible for the plasma etching of silicon

28th Plasmadynamics and Lasers Conference, 1997
Rik Blumenthal, Rik Blumenthal
openaire   +1 more source

Multiscale modeling of chemical vapor deposition and plasma etching

2000
In this work, a framework and a set of modeling tools capable of describing systems with key processes occurring on widely separated length and time scales has been developed. The major focus of this work is linking atomistic and continuum descriptions of gas phase transport.
openaire   +1 more source

Laser Plasma-Chemical Etching of Polycrystalline Diamond and Single-Crystal Sapphire

Russian Microelectronics, 2022
V S Kondratenko, Kondratenko V S
exaly  

Plasma-Chemical and Reactive-Ion Etching of Silicon in Tetrafluoromethane with Argon

Russian Microelectronics, 2022
D. B. Murin, S. A. Pivovarenok, A. S. Kozin   +2 more
openaire   +1 more source

Chemically selective, anisotropic plasma etching

Microelectronics Reliability, 1978
openaire   +1 more source