Results 231 to 240 of about 24,132 (263)

PLASMA-CHEMICAL ETCHING OF SILICON DIOXIDE FILMS

Radio communication technology, 2019
V. N. Zima, A. N. Kuznetsov, S. A. Kuznetsova   +2 more
openaire   +1 more source

The “Plasma-chemical etching” Virtual Lab

2013
Zaitsev, Alexander, Baburov, Vitaliy
openaire   +1 more source

Surface Chemical Reactions of Etch Stop Prevention in Plasma-Enhanced Atomic Layer Etching of Silicon Nitride

Surface and Coatings Technology, 2023
Jomar U. Tercero, Akiko Hirata, Michiro Isobe, Kazuhiro Karahashi, Masanaga Fukasawa, Satoshi Hamaguchi   +5 more
openaire   +1 more source

Chemical reactions responsible for the plasma etching of silicon

28th Plasmadynamics and Lasers Conference, 1997
Rik Blumenthal, Rik Blumenthal
openaire   +1 more source

Plasma-Chemical and Reactive-Ion Etching of Silicon in Tetrafluoromethane with Argon

Russian Microelectronics, 2022
D. B. Murin, S. A. Pivovarenok, A. S. Kozin   +2 more
openaire   +1 more source

Chemically selective, anisotropic plasma etching

Microelectronics Reliability, 1978
openaire   +1 more source

Multiscale modeling of chemical vapor deposition and plasma etching

2000
In this work, a framework and a set of modeling tools capable of describing systems with key processes occurring on widely separated length and time scales has been developed. The major focus of this work is linking atomistic and continuum descriptions of gas phase transport.
openaire   +1 more source

Effects of ion bombardment and chemical reaction on wafer temperature during plasma etching

Journal of Applied Physics, 1990
O Joubert, J Pelletier
exaly  

Effects of N2 addition on chemical dry etching of silicon oxide layers in F2∕N2∕Ar remote plasmas

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 2006
N ‐E Lee
exaly  

Texturing of multicrystalline silicon with acidic wet chemical etching and plasma etching

2003
Schultz, O., Emanuel, G., Glunz, S.W., Willeke, G.P.   +3 more
openaire   +1 more source