Results 21 to 30 of about 22,855 (262)

Studying the efficacy of hydrogen plasma treatment for enabling the etching of thermally annealed ruthenium in chemical solutions

Micro and Nano Engineering, 2023
Ruthenium (Ru) is a noble metal and is known to be resistant to many common chemicals and mixtures. We report in this study a controlled etching/recessing of Ru via wet processing and a combination of dry and wet process using metal-free chemical ...
Q.T. Le, E. Gül Arslan, J. Rip, H. De Coster, P. Verdonck, D. Radisic, F. Schleicher, I. Vaesen, T. Conard, E. Altamirano-Sanchez   +9 more
doaj   +1 more source

A Facile, Low-Cost Plasma Etching Method for Achieving Size Controlled Non-Close-Packed Monolayer Arrays of Polystyrene Nano-Spheres

Nanomaterials, 2019
Monolayer nano-sphere arrays attract great research interest as they can be used as templates to fabricate various nano-structures. Plasma etching, and in particular high-frequency plasma etching, is the most commonly used method to obtain non-close ...
Yun Chen, Dachuang Shi, Yanhui Chen, Xun Chen, Jian Gao, Ni Zhao, Ching-Ping Wong   +6 more
doaj   +1 more source

Evolution of surface morphology and properties of diamond films by hydrogen plasma etching

Green Processing and Synthesis, 2023
The micron-scale diamond film was prepared using hydrogen and methane as the mixed gas supplies via self-developed 3 kW/2,450 MHz microwave plasma chemical vapor deposition (MPCVD) equipment.
Chu Genjie, Li Sijia, Gao Jiyun, Yang Li, Hou Ming, Guo Shenghui   +5 more
doaj   +1 more source

Estimation of the Optimum Etching Time and Etching Parameters for CR-39 Nuclear Tracks Detector by Applying Plasma and Chemical Etching Techniques

Al-Mustansiriyah Journal of Science
Background: CR-39 nuclear track detectors are widely used in various fields, including science, technology, astronomy, and environmental preservation, to detect and register heavy ions, neutrons, and alpha particles.
Abdulkader Makki Dahham, Jamoliddin Razzokov, Eldor Karimbaev, Raghad S. Mohammed   +3 more
doaj   +1 more source

High-density plasma etching characteristics of aluminum-doped zinc oxide thin films in Cl2/Ar plasma

Materials Research Express, 2020
We investigated the etching characteristics of aluminum-doped zinc oxide (AZO) thin films in an adaptively coupled plasma (ACP) system. The dry etching characteristics of AZO films were studied by changing the Cl _2 /Ar gas mixing ratio, RF power, DC ...
Liting Zhang, Young-Hee Joo, Doo-Seung Um, Chang-Il Kim   +3 more
doaj   +1 more source

Peculiarity of plasmachemical etching of silicon plate edges of photoelectric converters [PDF]

Tekhnologiya i Konstruirovanie v Elektronnoi Apparature, 2009
Results of technological researches of plasmachemical reactor (PCR) for etching of silicon plate edges of photo-electric converters are described. Dependences of silicon etching speed on a discharge current, magnetic field intensity, quantity of the ...
Fedorovich O. A., Kruglenko M. P., Polozov B. P.   +2 more
doaj   +2 more sources

Evolution of defect formation during atomically precise desulfurization of monolayer MoS2

Communications Materials, 2021
Desulfurization of MoS2 alters its chemical and physical properties by breaking structural symmetry. Here, the atomic-scale mechanistic pathway by which this occurs is investigated during plasma etching, and changes in chemical structure and physical ...
Jong-Young Lee, Jong Hun Kim, Yeonjoon Jung, June Chul Shin, Yangjin Lee, Kwanpyo Kim, Namwon Kim, Arend M. van der Zande, Jangyup Son, Gwan-Hyoung Lee   +9 more
doaj   +1 more source

Reactive Ion Etching of X-Cut LiNbO₃ in an ICP/TCP System for the Fabrication of an Optical Ridge Waveguide

Applied Sciences, 2023
In this study, the technology for producing ridge waveguides with a minimal roughness of the sidewalls and material surface in a near-waveguide region was developed with the purpose of fabricating miniature photonic integrated circuits on a LiNbO3 ...
Andrei Kozlov, Dmitrii Moskalev, Uliana Salgaeva, Anna Bulatova, Victor Krishtop, Anatolii Volyntsev, Alexander Syuy   +6 more
doaj   +1 more source

Anisotropic and low damage III-V/Ge heterostructure etching for multijunction solar cell fabrication with passivated sidewalls

Micro and Nano Engineering, 2021
This article presents a complete plasma etching process to etch high aspect ratio patterns on III-V/Ge solar cell heterostructure with low damage for the fabrication of multijunction solar cells with a through cell via contact architecture.
Mathieu de Lafontaine, Erwine Pargon, Guillaume Gay, Camille Petit-Etienne, Sylvain David, Jean-Paul Barnes, Névine Rochat, Abdelatif Jaouad, Maïté Volatier, Simon Fafard, Vincent Aimez, Maxime Darnon   +11 more
doaj   +1 more source

Analytical model of plasma-chemical etching in planar reactor [PDF]

Journal of Physics: Conference Series, 2016
The paper discusses an analytical model of plasma-chemical etching in planar diode- type reactor. Analytical expressions of etch rate and etch anisotropy were obtained. It is shown that etch anisotropy increases with increasing the ion current and ion energy.
D S Veselov, A D Bakun, Yu A Voronov, V Yu Kireev, O V Vasileva   +4 more
openaire   +1 more source