Results 1 to 10 of about 95,287 (195)

Low-Temperature Plasma-Enhanced Atomic Layer Deposition of SiO₂ Using Carbon Dioxide. [PDF]

Nanoscale Res Lett, 2019
In this work, we report the successful growth of high-quality SiO2 films by low-temperature plasma-enhanced atomic layer deposition using an oxidant which is compatible with moisture/oxygen sensitive materials.
Zhu Z, Sippola P, Ylivaara OME, Modanese C, Di Sabatino M, Mizohata K, Merdes S, Lipsanen H, Savin H.   +8 more
europepmc   +7 more sources

Atomistic Simulations of Plasma-Enhanced Atomic Layer Deposition. [PDF]

Materials (Basel), 2019
Plasma-enhanced atomic layer deposition (PEALD) is a widely used, powerful layer-by-layer coating technology. Here, we present an atomistic simulation scheme for PEALD processes, combining the Monte Carlo deposition algorithm and structure relaxation using molecular dynamics.
Becker M, Sierka M.
europepmc   +4 more sources

Compact Ga₂O₃ Thin Films Deposited by Plasma Enhanced Atomic Layer Deposition at Low Temperature. [PDF]

Nanomaterials (Basel), 2022
Amorphous Gallium oxide (Ga2O3) thin films were grown by plasma-enhanced atomic layer deposition using O2 plasma as reactant and trimethylgallium as a gallium source.
Yang Y, Zhang XY, Wang C, Ren FB, Zhu RF, Hsu CH, Wu WY, Wuu DS, Gao P, Ruan YJ, Lien SY, Zhu WZ.   +11 more
europepmc   +2 more sources

Plasma-enhanced atomic layer deposition of nanostructured gold near room temperature [PDF]

ACS Applied Materials & Interfaces, 2019
A plasma-enhanced atomic layer deposition (PE-ALD) process to deposit metallic gold is reported, using the previously reported Me3Au(PMe3) precursor with H-2 plasma as the reactant.
Baets, Roel, Barry, Seán T, Clemmen, Stéphane, Dendooven, Jolien, Detavernier, Christophe, Feng, Ji-Yu, Griffiths, Matthew BE, Karuparambil Ramachandran, Ranjith, Minjauw, Matthias, Raza, Ali, Solano, Eduardo, Van Daele, Michiel   +11 more
core   +5 more sources

Dataset for TiN Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition Using Tetrakis(dimethylamino)titanium (TDMAT) and Titanium Tetrachloride (TiCl₄) Precursor. [PDF]

Data Brief, 2020
A dataset in this report is regarding an article “Ultrathin Effective TiN Protective Films Prepared by Plasma-Enhanced Atomic Layer Deposition for High Performance Metallic Bipolar Plates of Polymer Electrolyte Membrane Fuel Cells” [1].
Lee WJ, Yun EY, Lee HB, Hong SW, Kwon SH.   +4 more
europepmc   +2 more sources

Tuning of undoped ZnO thin film via plasma enhanced atomic layer deposition and its application for an inverted polymer solar cell [PDF]

AIP Advances, 2013
We studied the tuning of structural and optical properties of ZnO thin film and its correlation to the efficiency of inverted solar cell using plasma-enhanced atomic layer deposition (PEALD).
Mi-jin Jin, Junhyeon Jo, Guru P. Neupane, Jeongyong Kim, Ki-Seok An, Jung-Woo Yoo   +5 more
doaj   +3 more sources

Plasma-Enhanced Atomic Layer Deposition of TiN Thin Films as an Effective Se Diffusion Barrier for CIGS Solar Cells. [PDF]

Nanomaterials (Basel), 2021
Plasma-enhanced atomic layer deposition (PEALD) of TiN thin films were investigated as an effective Se diffusion barrier layer for Cu (In, Ga) Se2 (CIGS) solar cells.
Woo HJ, Lee WJ, Koh EK, Jang SI, Kim S, Moon H, Kwon SH.   +6 more
europepmc   +2 more sources

Plasma-Enhanced Atomic Layer Deposition of AlF₃ Antireflective Coatings via Pulse-Time Control of Fluorine Radical Reactions. [PDF]

Nanomaterials (Basel)
Plasma-enhanced atomic layer deposition (PEALD) is used to grow high-quality aluminum fluoride (AlF3) antireflective coatings via a safe, HF-free route using trimethylaluminum and SF6 plasma.
Zhang J, Zhang Z, Hsu CH, Gao P, Qiu Y, Lin Y, Lien SY.   +6 more
europepmc   +2 more sources

Direct Growth of Al₂O₃ on Black Phosphorus by Plasma-Enhanced Atomic Layer Deposition. [PDF]

Nanoscale Res Lett, 2017
Growing high-quality and uniform dielectric on black phosphorus is challenging since it is easy to react with O2 or H2O in ambient. In this work, we have directly grown Al2O3 on BP using plasma-enhanced atomic layer deposition (PEALD).
Wu BB, Zheng HM, Ding YQ, Liu WJ, Lu HL, Zhou P, Chen L, Sun QQ, Ding SJ, Zhang DW.   +9 more
europepmc   +2 more sources

Effect of Plasma-Enhanced Atomic Layer Deposition on Oxygen Overabundance and Its Influence on the Morphological, Optical, Structural, and Mechanical Properties of Al-Doped TiO₂ Coating. [PDF]

Micromachines (Basel), 2021
The chemical, structural, morphological, and optical properties of Al-doped TiO2 thin films, called TiO2/Al2O3 nanolaminates, grown by plasma-enhanced atomic layer deposition (PEALD) on p-type Si and commercial SLG glass were discussed.
Chiappim W, Testoni G, Miranda F, Miranda F, Fraga M, Furlan H, Saravia DA, Sobrinho ADS, Petraconi G, Maciel H, Pessoa R.   +10 more
europepmc   +2 more sources