Effect of Process Temperature on Density and Electrical Characteristics of Hf0.5Zr0.5O2 Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition. [PDF]
Kim HG, Hong DH, Yoo JH, Lee HC.
europepmc +1 more source
High-Performance GaN-Based Green Flip-Chip Mini-LED with Lattice-Compatible AlN Passivation Layer
The GaN-based green miniaturized light-emitting diode (mini-LED) is a key component for the realization of full-color display. Optimized passivation layers can alleviate the trapping of carriers by sidewall defects and are regarded as an effective way to
Jiahao Song +9 more
doaj +1 more source
Plasma enhanced atomic layer deposition of zinc sulfide thin films [PDF]
Detavernier, Christophe +3 more
core +1 more source
Metal-oxide-semiconductor field-effect transistors (MOSFET's) using atomic-layer-deposited (ALD) Al$_2$O$_3$ as the gate dielectric are fabricated on the Si/Si$_{1-x}$Ge$_x$ heterostructures.
Lai, K. +6 more
core +1 more source
We report on the transition between two regimes from several-atom clusters to much larger nanoparticles in Ar magnetron sputter deposition of WSi2, and the effect of nanoparticles on the properties of amorphous thin films and multilayers.
A. L. Barabasi +11 more
core +1 more source
Superhigh energy storage density on-chip capacitors with ferroelectric Hf0.5Zr0.5O2/antiferroelectric Hf0.25Zr0.75O2 bilayer nanofilms fabricated by plasma-enhanced atomic layer deposition. [PDF]
He Y +5 more
europepmc +1 more source
Highly Homogeneous Current Transport in Ultra-Thin Aluminum Nitride (AlN) Epitaxial Films on Gallium Nitride (GaN) Deposited by Plasma Enhanced Atomic Layer Deposition. [PDF]
Schilirò E +12 more
europepmc +1 more source
MgF2 films are prepared using plasma-enhanced atomic layer deposition (PEALD). The influence of substrate temperature on the growth behavior, chemical composition, and optical properties of MgF2 films is systematically investigated.
Shui-Yang Lien +6 more
doaj +1 more source
In this study, we established a microwave remote plasma source (MW-RPS) to perform plasma-enhanced atomic layer deposition to grow an In _2 O _3 channel for FET applications.
Yuto Kawato +4 more
doaj +1 more source
Field Emission from Carbon Nanotubes on Titanium Nitride-Coated Planar and 3D-Printed Substrates
Carbon nanotubes (CNTs) are well known for their outstanding field emission (FE) performance, facilitated by their unique combination of electrical, mechanical, and thermal properties. However, if the substrate of choice is a poor conductor, the electron
Stefanie Haugg +6 more
doaj +1 more source

