Results 161 to 170 of about 360 (212)

SERS Facemask for Rapid and Portable Sensing Mycobacterium Tuberculosis Antigens for TB Screening

Advanced Science, EarlyView.
Our study introduced an Au─Ag embedded covalent organic framework (U@COF) ‐mediated facemask for sensing TB antigen ESAT‐6/CFP‐10 complex in clinical droplet samples toward TB screening. Practical analysis of clinical samples demonstrated the availability of our facemask, which is capable of identifying the TB subjects (N = 17) from healthy candidates (
Lingzhi Chen, Jiaqi Yu, Jing Xu, Lingqi Chen, Ninghao Zhang, Wenrui Li, Runmin Zeng, Xiaomin Luo, Yiqun Chang, Jiayin Lai, Wenshi Huang, Xiaochen Liang, Ting Zhao, Shanze Chen, Huaihong Cai, Yanguang Cong, Pinghua Sun, Jiang Pi, Xueqin Huang, Haibo Zhou, Junxia Zheng   +20 more
wiley   +1 more source

Optimized Ex Vivo Human Liver Slice Culture Maintains Extended Viability and Function for Hepatotoxicity Testing

Advanced Science, EarlyView.
An optimized ex vivo human liver slice culture system preserves tissue architecture, hepatocyte function, and immune‐stromal complexity for at least five days. By refining slice thickness, oxygenation, air‐liquid interface, and extracellular matrix support, the platform enables human‐relevant hepatotoxicity testing and mechanistic studies, offering a ...
Huiche Feng, Cinzia Esposito, Andrej Benjak, Matthias S. Matter, Miriam Cieri, Camilla De Carlo, Philipp Sedlaczek, Fabian Haak, Mattia Marinucci, Gabriel Fridolin Hess, Otto Kollmar, Mairene Coto‐Llerena, Luca Di Tommaso, Visar Vela, Lukas Bubendorf, Luigi M. Terracciano, Charlotte K. Y. Ng, Salvatore Piscuoglio   +17 more
wiley   +1 more source

Advantages and challenges of plasma enhanced atomic layer deposition

, 2011
openaire   +1 more source

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Patterned deposition by plasma enhanced spatial atomic layer deposition

Physica Status Solidi - Rapid Research Letters, 2011
AbstractAn atmospheric pressure plasma enhanced atomic layer deposition reactor has been developed, to deposit Al2O3 films from trimethyl aluminum and an He/O2 plasma. This technique can be used for 2D patterned deposition in a single in‐line process by making use of switched localized plasma sources.
Fred Roozeboom
exaly   +3 more sources

Plasma-enhanced atomic layer deposition of BaTiO3

Scripta Materialia, 2016
Abstract Among high-k thin films, perovskite BaTiO3 (BTO) is an attractive candidate due to its exceptionally high dielectric constant. In contrast to conventional atomic layer deposition (ALD), plasma-enhanced ALD (PEALD) has several advantages such as lower process temperature, improved film quality and the deposition of a wider spectrum of ...
Peter Schindler, Jihwan An, Dickson Thian   +2 more
exaly   +2 more sources

Characteristics and applications of plasma enhanced-atomic layer deposition

Thin Solid Films, 2011
Abstract Atomic layer deposition (ALD) is expected to play an important role in future device fabrication due to various benefits, such as atomic level thickness control and excellent conformality. Plasma enhanced ALD (PE-ALD) allows deposition at significantly lower temperatures with better film properties compared to that of conventional thermal ...
Hyungjun Kim
exaly   +2 more sources

Plasma-Enhanced Atomic Layer Deposition of Silver Thin Films

Chemistry of Materials, 2011
Thermal properties of various silver precursors known in the literature were evaluated in order to discover which precursor is the most suitable one for plasma-enhanced atomic layer deposition (PEALD) of silver thin films. Ag(fod)(PEt3) (fod = 2,2-dimethyl-6,6,7,7,8,8,8-heptafluorooctane-3,5-dionato) was found to be the best choice. Using Ag(fod)(PEt3)
Markku Antero Leskelä, Marianna Leena Kemell, Mikko Kalervo Ritala   +2 more
exaly   +3 more sources

Plasma-Enhanced Atomic Layer Deposition of Ni

Japanese Journal of Applied Physics, 2010
Ni plasma enhanced atomic layer deposition (PE-ALD) using bis(dimethylamino-2-methyl-2-butoxo)nickel [Ni(dmamb)2] as a precursor and NH3or H2plasma as a reactant was comparatively investigated. PE-ALD Ni using NH3plasma showed higher growth rate, lower resistivity, and lower C content than that using H2plasma.
Lee, HBR, Bang, SH, Kim, WH, Gu, GH, Lee, YK, Chung, TM, Kim, CG, Park, CG, Kim, H   +8 more
openaire   +2 more sources

Plasma-enhanced atomic layer deposition of tungsten nitride

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2016
Tungsten nitride (WN) has potential as an interconnect barrier film. Deposition of WN films with bis(tert-butylimido)bis(dimethylamido)tungsten utilizing plasma-enhanced atomic layer deposition has been investigated over a temperature range of 100–400 °C employing N2, H2/N2, and NH3 remote plasmas.
Mark J. Sowa, Yonas Yemane, Fritz B. Prinz, J Provine   +3 more
openaire   +1 more source

Plasma-enhanced atomic layer deposition for plasmonic TiN

Nanophotonic Materials XIII, 2016
This work presents the low temperature plasma-enhanced atomic layer deposition (PE-ALD) of TiN, a promising plasmonic synthetic metal. The plasmonics community has immediate needs for alternatives to traditional plasmonic materials (e.g. Ag and Au), which lack chemical, thermal, and mechanical stability.
Lauren M. Otto, Aaron T. Hammack, Shaul Aloni, D. Frank Ogletree, Deirdre L. Olynick, Scott Dhuey, Bethanie J. H. Stadler, Adam M. Schwartzberg   +7 more
openaire   +1 more source