Results 181 to 190 of about 360 (212)

Fabrication of iron carbide by plasma-enhanced atomic layer deposition

Journal of Materials Research, 2019
Abstract
Xu Tian, Xiangyu Zhang, Yulian Hu, Bowen Liu, Yuxia Yuan, Lizhen Yang, Qiang Chen, Zhongwei Liu   +7 more
openaire   +1 more source

Plasma-Enhanced Atomic Layer Deposition of Ruthenium Thin Films

Electrochemical and Solid-State Letters, 2004
This work was supported by the project of National Research Laboratory ~NRL!. Korea Advanced Institute of Science and Technology assisted in meeting the publication costs of this article.
Kwon, OK, Kwon, SH, Park, HS, Kang, SW
openaire   +2 more sources

Plasma-enhanced atomic layer deposition of superconducting niobium nitride

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2016
Thin films of niobium nitride are useful for their physical, chemical, and electrical properties. NbN superconducting properties have been utilized in a wide range of applications. Plasma-enhanced atomic layer deposition (PEALD) of NbN with (t-butylimido) tris(diethylamido) niobium(V) and remote H2/N2 plasmas has been investigated.
Mark J. Sowa, Yonas Yemane, Jinsong Zhang, Johanna C. Palmstrom, Ling Ju, Nicholas C. Strandwitz, Fritz B. Prinz, J. Provine   +7 more
openaire   +1 more source

Plasma-enhanced atomic layer deposition of Co on metal surfaces

Surface and Coatings Technology, 2015
Abstract Co thin films were deposited using plasma-enhanced atomic layer deposition (PE-ALD) on various substrates such as Ru, Ta, SiO2, and Si. The growth characteristics of PE-ALD Co were investigated on the basis of their magnetic and electrical properties analyzed using a vibrating sample magnetometer (VSM) and four-point probe system ...
Jaehong Yoon, Jeong-Gyu Song, Hyungjun Kim, Han-Bo-Ram Lee   +3 more
openaire   +1 more source

Plasma‐Enhanced Atomic Layer Deposition of Palladium on a Polymer Substrate

Chemical Vapor Deposition, 2007
AbstractIn this paper, a method for the plasma‐enhanced (PE) atomic layer deposition (ALD) of palladium on air‐exposed, annealed poly(p‐xylylene) (Parylene‐N, or PPX) is presented. Palladium is successfully deposited on PPX at 80 °C using a remote, inductively coupled, hydrogen/nitrogen plasma with palladium (II) hexafluoroacetylacetonate (PdII(hfac)2)
G. A. Ten Eyck, S. Pimanpang, J. S. Juneja, H. Bakhru, T.‐M. Lu, G.‐C. Wang   +5 more
openaire   +1 more source

Plasma Enhanced Atomic Layer Deposition of TaN Thin Films

ECS Meeting Abstracts, 2010
Abstract not Available.
Paul Ma, Jiang Lu
openaire   +1 more source

Effect of plasma parameters on the properties of V2O5 deposited by plasma-enhanced atomic layer deposition

Journal of Vacuum Science & Technology A
In this work, we investigate the deposition of VOx thin films by plasma-enhanced atomic layer deposition. Specifically, we focus on the effects of the plasma operating conditions, including applied power, O2/Ar gas flow ratio, pressure, and coupling mode on the resulting thin film crystallinity and stoichiometry. In addition, we characterize the plasma
P. M. Litwin, N. Nepal, M. G. Sales, D. R. Boris, M. J. Johnson, S. G. Walton, V. D. Wheeler   +6 more
openaire   +1 more source

Atomic-Level Sn Doping Effect in Ga2O3 Films Using Plasma-Enhanced Atomic Layer Deposition

Nanomaterials, 2022
Jingtao Zhu, Jon Zhang, Hong-Ping Ma
exaly  

Plasma enhanced atomic layer deposition of Ga

Journal of Materials Chemistry A, 2014
Ranjith K. Ramachandran, Jolien Dendooven, Jonas Botterman, Sreeprasanth Pulinthanathu Sree, Dirk Poelman, Johan A. Martens, Hilde Poelman, Christophe Detavernier   +7 more
openaire   +1 more source

Growth of GaN Thin Films Using Plasma Enhanced Atomic Layer Deposition: Effect of Ammonia-Containing Plasma Power on Residual Oxygen Capture

International Journal of Molecular Sciences, 2022
Dong-Sing Wuu, Shui-Yang Lien, Wenzhang Zhu   +2 more
exaly