Results 171 to 180 of about 96,312 (290)

Wafer-Scale Demonstration of BEOL-Compatible Ambipolar MoS₂ Devices Enabled by Plasma-Enhanced Atomic Layer Deposition. [PDF]

ACS Appl Mater Interfaces
Martínez A, Márquez C, Lorenzo F, Gutiérrez F, Caño-García M, Ávila J, Galdón Gil JC, Lopez RO, Navarro C, Donetti L, Gámiz F.   +10 more
europepmc   +1 more source

Structural, Optical and Electrical Properties of HfO₂ Thin Films Deposited at Low-Temperature Using Plasma-Enhanced Atomic Layer Deposition. [PDF]

Materials (Basel), 2020
Kim KM, Jang JS, Yoon SG, Yun JY, Chung NK.   +4 more
europepmc   +1 more source

TiO2/HfO2 bi-layer gate stacks grown by atomic layer deposition for germanium-based metal-oxide-semiconductor devices using GeOxNy passivation layer [PDF]

, 2011
Caymax, Matty, Delabie, Annelies, Detavernier, Christophe, Jiang, Yu-Long, Lin, Dennis, Musschoot, Jan, Qu, Xin-Ping, Schaekers, Marc, Van den Berghe, Sven, Xie, Qi   +9 more
core   +1 more source

Mixed‐Metal Promotion in a Manganese‐Molybdenum Oxynitride as Catalyst to Integrate C─C and C─N Coupling Reactions for the Direct Synthesis of Acetonitrile from Syngas and Ammonia

Advanced Materials, EarlyView.
Transition metal oxy/carbo‐nitrides show great promise as catalysts for sustainable processes. A Mn‐Mo mixed‐metal oxynitride attains remarkable performance for the direct synthesis of acetonitrile, an important commodity chemical, via sequential C─N and C─C coupling from syngas (C1) and ammonia (N1) feedstocks.
M. Elena Martínez‐Monje, Wilson Henao, Tania Rodenas, Patricia Concepción, Virginia Pérez Dieste, Alexander Missyul, Giovanni Agostini, Gonzalo Prieto   +7 more
wiley   +1 more source

Retraction of "N₂/H₂ Plasma-Enhanced Atomic Layer Deposition for SiO₂ Gap Filling: Implications for Nanoelectronics in Semiconductor Manufacturing". [PDF]

ACS Appl Nano Mater
Okasha S, Munson D, Yoshikawa J.
europepmc   +1 more source

Kelvin Probe Force Microscopy in Bionanotechnology: Current Advances and Future Perspectives

Advanced Materials, EarlyView.
Kelvin probe force microscopy (KPFM) enables the nanoscale mapping of electrostatic surface potentials. While widely applied in materials science, its use in biological systems remains emerging. This review presents recent advances in KPFM applied to biological samples and provides a critical perspective on current limitations and future directions for
Ehsan Rahimi, Mario Palacios‐Corella, Arjan Mol, Salvador Pané, Josep Puigmartí‐Luis   +4 more
wiley   +1 more source

Improvement of Physical and Electrical Characteristics in 4H-SiC MOS Capacitors Using AlON Thin Films Fabricated via Plasma-Enhanced Atomic Layer Deposition. [PDF]

Materials (Basel)
Bai Z, Ding C, Guo Y, Luo M, Zhou Z, Gu L, Zhang Q, Ma H.   +7 more
europepmc   +1 more source

Two-dimensional BN buffer for plasma enhanced atomic layer deposition of Al₂O₃ gate dielectrics on graphene field effect transistors. [PDF]

Sci Rep, 2020
Snure M, Vangala SR, Prusnick T, Grzybowski G, Crespo A, Leedy KD.   +5 more
europepmc   +1 more source

Alkaline Leaching: A Facile Surface Activation Strategy to Improve the Reactivity of Air Electrodes for Solid Oxide Fuel Cells

Advanced Materials, EarlyView.
This study shows that alkaline leaching of PrBa0.8Ca0.2Co2O5+δ under anodic bias selectively removes Ba and Ca, forming a cobalt‐rich and amorphous layer. The modified surface significantly boosts ORR activity, offering a simple and effective strategy to improve electrochemical device performance.
Yeongtaek Hong, Hyunseung Kim, Sang Won Lee, Yong Beom Kim, SungHyun Jeon, Sangwoo Kim, Hainan Sun, Jeongah Lee, Seongwoo Nam, Seungwoo Roh, Tae Ho Shin, WooChul Jung   +11 more
wiley   +1 more source

Relation Between Thickness and TFTs Properties of HfO₂ Dielectric Layer Synthesized by Plasma-Enhanced Atomic Layer Deposition. [PDF]

Nanomaterials (Basel)
Chen Q, Fu W, Han J, Zhang X, Lien SY.
europepmc   +1 more source