Results 171 to 180 of about 5,793,656 (288)

A Liquid Ge(IV) Precursor for Low Temperature Plasma Enhanced Atomic Layer Deposition of Germanium Oxide Thin Films. [PDF]

Small
Preischel F, Rönnby K, Wilken M, Glauber JP, Froeschke S, Rogalla D, Gemming T, Popov AA, Dement P, Nolan M, Devi A.   +10 more
europepmc   +1 more source

Toward Pore‐Engineered 3D‐Printed Materials for Sorption Water Harvesting, Interfacial Evaporation, and Radiative Cooling

Advanced Materials, EarlyView.
Water harvesting, radiative cooling, and interfacial solar evaporation are fundamentally governed by coupled heat, mass, and light transport processes. These processes are mediated by pore architecture, including pore size, connectivity, and hierarchical organization.
Dejan J. Trajkovski, Higgins M. Wilson, Abdallah Y. M. Ali, Jiaxing Xu, Ruzhu Wang, Primož Poredoš   +5 more
wiley   +1 more source

Low-Temperature Plasma-Enhanced Atomic Layer Deposition of Cu Films Using Liquid Copper Precursor Bis(1-ethylmethylamino-2-propoxy)copper, Cu(emap)₂. [PDF]

ACS Omega
Nishida A, Yamashita A, Enzu M, Sakurai A, Matsuo Y.   +4 more
europepmc   +1 more source

Dual‐State Programmable Oxide Transistor for Time‐Based Cryptography

Advanced Materials, EarlyView.
A DUPOT enables independently tunable Vth and Isat depending on gate bias polarity, producing three‐dimensional dynamical behavior within a transfer characteristic. This behavior originates from charge trapping and oxygen‐ion migration in the HfO2 layer.
Huisu Noh, Min Gu Lee, Hwayoung Kim, Myeongchan Ko, Jungwan Noh, Taewook Go, Jingyao Yu, Sang‐Hee Ko Park, Himchan Cho, Kyung Min Kim   +9 more
wiley   +1 more source

Poly(Alkoxythiophene) Rod‐Coil Block Copolymers for Organic Electrochemical Transistors

Advanced Materials, EarlyView.
We present the first synthesis of poly(3‐alkoxythiophene) rod‐coil block copolymers as a new architecture for OMIECs. Incorporating PEG and PLLA coils can enhance device performance beyond the homopolymer. The figure‐of‐merit depends uniquely on coil length.
Junfu Tian, Wentao Shan, Rachael Found, Paola Mantegazza, Francesco Leoni, Andreas W. Erhardt, Yuyun Yao, Matus Stredansky, Arianna Magni, Adam Marks, Elena Chulanova, Zeinab Hamid, Yueying Huang, Wanpeng Lu, Xian'e Li, Baopu Zhang, Qingpei Wan, Christina Kousseff, Matilde Concilio, Ruth Theresia Arwani, Caroline A. Ross, Sahika Inal, Giovanni Costantini, Iain McCulloch   +23 more
wiley   +1 more source

Wafer-Scale Demonstration of BEOL-Compatible Ambipolar MoS₂ Devices Enabled by Plasma-Enhanced Atomic Layer Deposition. [PDF]

ACS Appl Mater Interfaces
Martínez A, Márquez C, Lorenzo F, Gutiérrez F, Caño-García M, Ávila J, Galdón Gil JC, Lopez RO, Navarro C, Donetti L, Gámiz F.   +10 more
europepmc   +1 more source

Electrical characteristics of top-down ZnO nanowire transistors using remote plasma ALD

Top-down fabrication is used to produce ZnO nanowires by remote plasma atomic layer deposition over a SiO2 pillar and anisotropic dry etching. Nanowire field-effect transistors (FETs), with channel lengths in the range of 1.3–18.6 µm, are then fabricated
Masaud, T.B., Ashburn, P., Fang, Q., Gunn, R., Allen, M. W., Partridge, J., Clark, O.D., Sultan, S.M., Sun, K., Chong, H.M.H.   +9 more
core   +1 more source

Atom–Cluster Synergy in Scalable Fe–Ru Dual‐Site Architectures Accelerates Alkaline Hydrogen Evolution

Advanced Materials, EarlyView.
A mechanochemically synthesized dual‐site electrocatalyst (RuNC@Fe1NC) accelerates alkaline hydrogen evolution via atomic‐level spatial decoupling. Oxophilic Fe single atoms effectively dissociate water, while adjacent Ru nanoclusters rapidly recombine hydrogen.
Jae‐Hoon Baek, Seong Hyeon Kweon, Sun Gwan Cha, Se Jung Lee, Jinwoo Baek, Dong Hyeok Kwon, Hojeong Lee, Youngkook Kwon, Sang Kyu Kwak, Jong‐Beom Baek   +9 more
wiley   +1 more source

Retraction of "N₂/H₂ Plasma-Enhanced Atomic Layer Deposition for SiO₂ Gap Filling: Implications for Nanoelectronics in Semiconductor Manufacturing". [PDF]

ACS Appl Nano Mater
Okasha S, Munson D, Yoshikawa J.
europepmc   +1 more source

Structural, Optical and Electrical Properties of HfO₂ Thin Films Deposited at Low-Temperature Using Plasma-Enhanced Atomic Layer Deposition. [PDF]

Materials (Basel), 2020
Kim KM, Jang JS, Yoon SG, Yun JY, Chung NK.   +4 more
europepmc   +1 more source