Results 191 to 200 of about 5,793,656 (288)
Self‐invalidating multilayer physical unclonable functions (PUFs) integrate fingerprint‐like metal nanopattern bilayers from block copolymer templates with highly reactive reduced graphene oxide (rGO) interlayers. This tamper‐responsive architecture blocks all unauthorized physical and chemical replication attempts while autonomously deactivating ...
Gyu Hui Jo +7 more
wiley +1 more source
Effect of Precursor Purge Time on Plasma-Enhanced Atomic Layer Deposition-Prepared Ferroelectric Hf<sub>0.5</sub>Zr<sub>0.5</sub>O<sub>2</sub> Phase and Performance. [PDF]
Choi YK +11 more
europepmc +1 more source
Controlled Growth of Boron Nitride in Various Phases
Phase‐selective boron nitride growth is presented as a unified materials‐design problem across hexagonal, rhombohedral, cubic, and amorphous phases. By linking synthesis routes to thermodynamic stability, kinetic accessibility, surface diffusion, interfacial templating, and energetic activation, this review clarifies how bonding and stacking are ...
Pan Wu +6 more
wiley +1 more source
The thermal budget imposed during oxide passivation is revealed as a key design parameter for Pt resistance temperature detectors in Organ‐on‐a‐Chip platforms. By establishing a direct processing–microstructure–device performance relationship, this work transforms an unavoidable fabrication step into a strategy for reliable integrated temperature ...
Gabriel M. Ferreira +4 more
wiley +1 more source
Controlled Synthesis of Tri‐ and Multi‐Doped Graphene
This review systematically evaluates synthesis routes for tri‐ and multi‐doped graphene, from hydrothermal and pyrolysis methods to flash Joule heating, critically assessing how each governs dopant incorporation, bonding configuration, and resulting electronic properties.
Maria Hasan +4 more
wiley +1 more source
Electrical Properties of Ultrathin Platinum Films by Plasma-Enhanced Atomic Layer Deposition. [PDF]
Kim HJK +9 more
europepmc +1 more source
Recent Advances in Plasma‐Enhanced Atomic Layer Etching for Next‐Generation Nanofabrication
Continued semiconductor miniaturization demands atomic‐scale patterning and ultralow surface roughness beyond the capabilities of conventional reactive ion etching. This review highlights advances in isotropic and anisotropic plasma‐enhanced atomic layer etching since 2020, covering fundamental mechanisms, applications across major semiconductor ...
Shih‐Nan Hsiao
wiley +1 more source
Polymer‐derived SiCN(O) fibre mats enable anchoring of ultra‐low amounts of transition metals for efficient alkaline oxygen evolution. The distinct behaviour of Fe‐ and Ni‐based fibres highlights the importance of metal phase and support interactions in tailoring catalytic behaviour.
Eranezhuth Wasan Awin +5 more
wiley +1 more source
Atomistic simulations reveal the interlayer mechanics of additively manufactured materials, showing how build direction and layer interfaces govern diffusion, defect evolution, and mechanical strength. Distinct anisotropic behavior arises from interface‐controlled deformation and dislocation activity, establishing critical links between microstructural
Rohit Singh, Jinoop Arackal Narayanan
wiley +1 more source
A mask‐free and cost‐effective UV‐pico‐second laser‐based microfabrication method is proposed to fabricate large‐area biodegradable microelectrode arrays and pressure sensors. These devices demonstrate low impedance, good conformability, excellent biocompatibility, and rapid degradation, providing a new route for next‐generation transient electronics ...
Bhavani Prasad Yalagala +5 more
wiley +1 more source

