Results 261 to 270 of about 5,793,656 (288)

Plasma‐Enhanced Atomic Layer Deposition of Palladium on a Polymer Substrate

Chemical Vapor Deposition, 2007
AbstractIn this paper, a method for the plasma‐enhanced (PE) atomic layer deposition (ALD) of palladium on air‐exposed, annealed poly(p‐xylylene) (Parylene‐N, or PPX) is presented. Palladium is successfully deposited on PPX at 80 °C using a remote, inductively coupled, hydrogen/nitrogen plasma with palladium (II) hexafluoroacetylacetonate (PdII(hfac)2)
G. A. Ten Eyck, S. Pimanpang, J. S. Juneja, H. Bakhru, T.‐M. Lu, G.‐C. Wang   +5 more
openaire   +1 more source

Plasma Enhanced Atomic Layer Deposited Ru for MIMCAP Applications

ECS Meeting Abstracts, 2011
Abstract not Available.
Johan Swerts, M.M. Salimullah, M. Popovici, M.-S. Kim, M.A. Pawlak, A. Delabie, M. Schaekers, K. Tomida, B. Kaczer, K. Opsomer, C. Vrancken, I Debusschere, L. Altimime, J.A. Kittl, S. Van Elshocht   +14 more
openaire   +1 more source

Plasma Enhanced Atomic Layer Deposition of TaN Thin Films

ECS Meeting Abstracts, 2010
Abstract not Available.
Paul Ma, Jiang Lu
openaire   +1 more source

Plasma enhanced atomic layer deposition of copper: A comparison of precursors

Surface and Coatings Technology, 2013
Abstract The growth of Cu films by atomic layer deposition using hydrogen plasma has been investigated. To obtain continuous films at sub 5 nm thicknesses the two dimensional coalescence of Cu nucleation sites formed at the start of the deposition process must be enhanced in preference to three dimensional island growth.
D.J. Hagen, J. Connolly, R. Nagle, I.M. Povey, S. Rushworth, P. Carolan, P. Ma, M.E. Pemble   +7 more
openaire   +1 more source

Effect of plasma parameters on the properties of V2O5 deposited by plasma-enhanced atomic layer deposition

Journal of Vacuum Science & Technology A
In this work, we investigate the deposition of VOx thin films by plasma-enhanced atomic layer deposition. Specifically, we focus on the effects of the plasma operating conditions, including applied power, O2/Ar gas flow ratio, pressure, and coupling mode on the resulting thin film crystallinity and stoichiometry. In addition, we characterize the plasma
P. M. Litwin, N. Nepal, M. G. Sales, D. R. Boris, M. J. Johnson, S. G. Walton, V. D. Wheeler   +6 more
openaire   +1 more source

Atomic-Level Sn Doping Effect in Ga2O3 Films Using Plasma-Enhanced Atomic Layer Deposition

Nanomaterials, 2022
Jon Zhang, Hong-Ping Ma, Yi Shen
exaly  

Plasma enhanced atomic layer deposition of Ga

Journal of Materials Chemistry A, 2014
Ranjith K. Ramachandran, Jolien Dendooven, Jonas Botterman, Sreeprasanth Pulinthanathu Sree, Dirk Poelman, Johan A. Martens, Hilde Poelman, Christophe Detavernier   +7 more
openaire   +1 more source

Plasma deposition—Impact of ions in plasma enhanced chemical vapor deposition, plasma enhanced atomic layer deposition, and applications to area selective deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 2020
Taguhi Yeghoyan, Christophe Vallée
exaly  

SELECTIVE PLASMA ENHANCED ATOMIC LAYER DEPOSITION

2022
PEARLSTEIN RONALD M, LEI XINJIAN, RIDGEWAY ROBERT GORDON, WU AIPING, LEE YI-CHIA, AGARWAL SUMIT, RAMESH ROHIT NARAYANAN KAVASSERY, XU WANXING, GASVODA RYAN JAMES   +8 more
openaire   +1 more source

Comparative Study of Thermal and Plasma-Enhanced Atomic Layer Deposition of Iron Oxide Using Bis(N,N′-di-butylacetamidinato)iron(II)

Nanomaterials, 2023
Jong-Ryul Jeong, Nari Jeon, Boyun Choi   +2 more
exaly