Results 21 to 30 of about 95,287 (195)
Growth chemistry of cobalt nitride by plasma enhanced atomic layer deposition
Materials Research Express, 2022 State-of-the-art atomic layer deposition (ALD) and photoemission characterisation are applied to grow and characterise cobalt nitride, a material that has applications in renewable energy and semiconductor technologies.
S O’Donnell +9 more
doaj +1 more source
Pyroelectric and Ferroelectric Properties of Hafnium Oxide Doped with Si via Plasma Enhanced ALD
Crystals, 2022 Devices based on ferroelectric hafnium oxide are of major interest for sensor and memory applications. In particular, Si-doped hafnium oxide layers are investigated for the application in the front-end-of-line due to their resilience to high thermal ...
Markus Neuber +5 more
doaj +1 more source
Molecules, 2022 Gallium nitride (GaN) is a wide bandgap semiconductor with remarkable chemical and thermal stability, making it a competitive candidate for a variety of optoelectronic applications.
Fang-Bin Ren +8 more
doaj +1 more source
Plasma-enhanced atomic layer deposition for plasmonic TiN (Erratum) [PDF]
Nanophotonic Materials XIII, 2020 Publisher’s Note: This paper, originally published on 3 October 2016, was replaced with a corrected version on 12 May 2020. If you downloaded the original PDF but are unable to access the revision, please contact SPIE Digital Library Customer Service for assistance.
Lauren M. Otto +7 more
openaire +1 more source
Influence of NiO ALD Coatings on the Field Emission Characteristic of CNT Arrays
Nanomaterials, 2022 The paper presents a study of a large-area field emitter based on a composite of vertically aligned carbon nanotubes covered with a continuous and conformal layer of nickel oxide by the atomic layer deposition method.
Maksim A. Chumak +6 more
doaj +1 more source
Plasma-Enhanced Atomic Layer Deposition of III-Nitride Thin Films [PDF]
ECS Meeting Abstracts, 2013 Abstract not Available.
Ozgit-Akgun, Çağla +2 more
openaire +2 more sources
Micromachines, 2023 This study demonstrates the low-temperature (
Shih-Chin Lin +5 more
doaj +1 more source
Mobile setup for synchrotron based in situ characterization during thermal and plasma-enhanced atomic layer deposition [PDF]
, 2016 We report the design of a mobile setup for synchrotron based in situ studies during atomic layer processing. The system was designed to facilitate in situ grazing incidence small angle x-ray scattering (GISAXS), x-ray fluorescence (XRF), and x-ray ...
Alessandro Coati +10 more
core +2 more sources
Polymer Testing, 2021 Atomic layer deposition (ALD) on polymer substrates often requires a modification of the polymer surface properties. Plasma-enhanced ALD (PE-ALD) process is capable of establishing improved coating/substrate adhesion and layer properties by a plasma pre ...
Réka Lilla Kovács +8 more
doaj +1 more source
Plasma-enhanced atomic layer deposition of vanadium phosphate as a lithium-ion battery electrode material [PDF]
, 2017 Vanadium phosphate films were deposited by a new process consisting of sequential exposures to trimethyl phosphate (TMP) plasma, O2 plasma, and either vanadium oxytriisopropoxide [VTIP, OV(O-i-Pr)3] or tetrakisethylmethylamido vanadium [TEMAV, V(NEtMe)4]
Detavernier, Christophe +3 more
core +1 more source