Results 71 to 80 of about 95,287 (195)

Correlation of film density and wet etch rate in hydrofluoric acid of plasma enhanced atomic layer deposited silicon nitride

open access: yesAIP Advances, 2016
The continued scaling in transistors and memory elements has necessitated the development of atomic layer deposition (ALD) of silicon nitride (SiNx), particularly for use a low k dielectric spacer. One of the key material properties needed for SiNx films
J. Provine   +6 more
doaj   +1 more source

Correlating the nanostructure of Al-oxide with deposition conditions and dielectric contributions of two-level systems in perspective of superconducting quantum circuits [PDF]

open access: yes, 2017
This work is concerned with Al/Al-oxide(AlO$_{x}$)/Al-layer systems which are important for Josephson-junction-based superconducting devices such as quantum bits.
Fritz, S.   +6 more
core   +3 more sources

Effects of Dielectric Stoichiometry on the Photoluminescence Properties of Encapsulated WSe2 Monolayers [PDF]

open access: yes, 2017
Two-dimensional transition-metal-dichalcogenide semiconductors have emerged as promising candidates for optoelectronic devices with unprecedented properties and ultra-compact performances.
Bonanni, Alberta   +10 more
core   +2 more sources

A film-texture driven piezoelectricity of AlN thin films grown at low temperatures by plasma-enhanced atomic layer deposition

open access: yesAPL Materials, 2020
Simultaneously inducing preferred crystalline orientation with a strong piezoelectric response in polycrystalline aluminum nitride (AlN) thin films by atomic layer deposition is a technical challenge due to the upscaling of the integration of ...
Tai Nguyen   +6 more
doaj   +1 more source

Argon plasma treatment techniques on steel and effects on diamond-like carbon structure and delamination [PDF]

open access: yes, 2011
Copyright © 2011 Elsevier B.V. All rights reserved.We demonstrate alteration in diamond-like carbon (DLC) film structure, chemistry and adhesion on steel, related to variation in the argon plasma pretreatment stage of plasma enhanced chemical vapour ...
B.J. Jones   +28 more
core   +1 more source

Characteristics of Zirconium Oxide Films Deposited by Plasma-Enhanced Atomic Layer Deposition [PDF]

open access: yesECS Meeting Abstracts, 2006
Abstract not Available.
Sun Jin Yun, Jung Wook Lim, Jin Ho Lee
openaire   +1 more source

Inhibition of Anti-Reflection Film Cracks on Plastic Substrates Using Nanolaminate Layer Deposition in Plasma-Enhanced Atomic Layer Deposition

open access: yesTechnologies
In this research, we mainly increase the adhesion of PMMA substrate and film, which is reflected in the environmental test. This study used plasma-enhanced atomic layer deposition (PEALD) to find the relationship between the intensity of XRD reflection ...
Chi-Chieh Wang   +4 more
doaj   +1 more source

Long Term Evaluation of the Barrier Properties of Polymer/Metal Oxide Hybrid Layers for Use in Medical Implants

open access: yesCurrent Directions in Biomedical Engineering, 2022
Encapsulation is essential for mechanically flexible and electrically active implants as it protects them from the harsh environment inside the body.
Simon Nicolai   +3 more
doaj   +1 more source

Optical properties of refractory metal based thin films [PDF]

open access: yes, 2018
There is a growing interest in refractory metal thin films for a range of emerging nanophotonic applications including high temperature plasmonic structures and infrared superconducting single photon detectors. We present a detailed comparison of optical
Banerjee, Archan   +6 more
core   +3 more sources

Growth of aligned carbon nanotubes on carbon microfibers by dc plasma-enhanced chemical vapor deposition [PDF]

open access: yes, 2006
It is shown that unidirectionally aligned carbon nanotubes can be grown on electrically conductive network of carbon microfibers via control of buffer layer material and applied electric field during dc plasma chemical vapor deposition growth.
AuBuchon, J. F.   +7 more
core   +1 more source

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