Production of carbon nanotubes by PECVD and their applications to supercapacitors
, 2010 Màster en Nanociència i NanotecnologiaPlasma enhanced chemical vapor deposition (PECVD) is a versatile technique to obtain vertically dense-aligned carbon nanotubes (CNTs) at lower temperatures than chemical vapor deposition (CVD).
Caglar, Burak
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Plasma-Enhanced Atomic Layer Deposition of TiAlN: Compositional and Optoelectronic Tunability
ACS Applied Materials & Interfaces, 2019 Titanium nitride (TiN) is a unique refractory plasmonic material, the nanocomposites and alloys of which provide further opportunities to tailor its optical and photonic properties. We prepare TiAlN films of continuously variable compositions through the systematic variation of TiN versus AlN cycle ratio in plasma-enhanced atomic layer deposition ...
Nari Jeon +3 more
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Conformality of Al2O3 deposited by thermal, plasma-enhanced and ozone-based atomic layer deposition [PDF]
, 2010 C
Deduytsche, Davy +3 more
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Elemental distribution and oxygen deficiency of magnetron sputtered ITO films
, 2011 The atomic structure and composition of non-interfacial ITO and ITO-Si interfaces were studied with Transmission Electron Microscopy (TEM) and X-ray Photoelectron Spectroscopy (XPS). The films were deposited by DC magnetron sputtering on mono-crystalline
Diplas, Spyros +4 more
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Nanoroughness, Surface Chemistry and Drug Delivery Control by Atmospheric Plasma Jet on Implantable Devices [PDF]
, 2018 Implantable devices need specific tailored surface morphologies and chemistries to interact with the living systems or to actively induce a biological response also by the release of drugs or proteins.
Ambrosi, Emmanuele +8 more
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NanomaterialsPlasma-enhanced atomic layer deposition (ALD) is a common method for fabricating Hf0.5Zr0.5O2 (HZO) ferroelectric thin films that can be performed using direct-plasma (DP) and remote-plasma (RP) methods.
Won-Ji Park +6 more
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Investigation of ultra-thin Al₂O₃ film as Cu diffusion barrier on low-k (k=2.5) dielectrics [PDF]
, 2011 Ultrathin Al(2)O(3) films were deposited by PEALD as Cu diffusion barrier on low-k (k=2.5) material. The thermal stability and electrical properties of the Cu/low k system with Al(2)O(3) layers with different thickness were studied after annealing.
Chen, Fei +8 more
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Atomic layer deposition of Ta-based thin films: Reactions of alkylamide precursor with various reactants [PDF]
The growth mechanisms and film properties of atomic layer deposition (ALD) Ta-based thin films were investigated from alkylamide precursor [Ta(NMe2)(5), (PDMAT)].
Kim, H, Maeng, WJ, Park, SJ
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Optimization of the Silver Nanoparticles PEALD Process on the Surface of 1-D Titania Coatings
Nanomaterials, 2017 Plasma enhanced atomic layer deposition (PEALD) of silver nanoparticles on the surface of 1-D titania coatings, such as nanotubes (TNT) and nanoneedles (TNN), has been carried out.
Aleksandra Radtke +8 more
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Plasma Nanoscience: from Nano-Solids in Plasmas to Nano-Plasmas in Solids
, 2013 The unique plasma-specific features and physical phenomena in the organization of nanoscale solid-state systems in a broad range of elemental composition, structure, and dimensionality are critically reviewed.
Meyyappan, M. +2 more
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