Monolayer MoS2 field effect transistor with low Schottky barrier height with ferromagnetic metal contacts. [PDF]
Gupta S +6 more
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A new <i>in situ</i> method for modifying the Schottky barrier height at buried metal-organic semiconductor interfaces. [PDF]
Sirringhaus H.
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Tuning the Schottky barrier height in single- and bi-layer graphene-inserted MoS2/metal contacts. [PDF]
Zhao X +6 more
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Tuning of Schottky Barrier Height at NiSi/Si Contact by Combining Dual Implantation of Boron and Aluminum and Microwave Annealing. [PDF]
Sun F +7 more
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Dependence of the Metal-Insulator-Semiconductor Schottky Barrier Height on Insulator Composition. [PDF]
Davis BE, Strandwitz NC.
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Thermofield Effects in Graphite-like Amorphous Carbon Films with Nanoscale Structure. [PDF]
Muratova EN +6 more
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An n-type Schottky contact with low tunneling resistance in a 2D FeB<sub>2</sub>/SiC heterostructure. [PDF]
Cuong NQ, Long LP, Phuc HV, Hien ND.
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Schottky Barrier Height Tuning via the Dopant Segregation Technique through Low-Temperature Microwave Annealing. [PDF]
Fu C +8 more
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Modulating Persistent Photoconductivity through Barrier Engineering for High-performance and Multifunctional Two-dimensional Optoelectronic Devices. [PDF]
Huo P +8 more
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Dirac metallic FeB<sub>2</sub>-induced low Schottky barrier and electrically tunable Schottky contact in FeB<sub>2</sub>/MoS<sub>2</sub> van der Waals heterostructure. [PDF]
Nhan TT, Cuong NQ, Nguyen CV, Phuc HV.
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