2D Indium Oxide at the Epitaxial Graphene/SIC Interface: Synthesis, Structure, Properties, and Devices. [PDF]
Turker F +18 more
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First-Principles Study on the Modulation of Schottky Barrier in Graphene/Janus MoSSe Heterojunctions by Interface Contact and Electric Field Effects. [PDF]
Zhang Z, Li J, Xu X, Shi G.
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Subthreshold Schottky-barrier transistor based on monolayer molybdenum disulfide. [PDF]
Liu M +13 more
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Advances in Interfacial Engineering and Structural Optimization for Diamond Schottky Barrier Diodes. [PDF]
Lu S +7 more
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Plasmon-Induced Graphene/Silicon Schottky Junctions for Ultrasensitive Gas Sensing. [PDF]
Drozdowska K +4 more
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Two-dimensional TaS<sub>2</sub> as a contact material for MXene Sc<sub>2</sub>CF<sub>2</sub> semiconductors: a first-principles study. [PDF]
Vu TV +4 more
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Schottky barrier height enhancement on n-ln0.53Ga0.47
Lüth, H. +3 more
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Schottky-barrier devices with low barrier height
Proceedings of the IEEE, 1974It is calculated that the barrier height of the Schottky diode has an optimum value of ∼0.3 V for the detector, the harmonic generator, and the frequency converter at high frequency. The low barrier height can be realized by the mixed crystal (n-type) composed of InAs (i.e., In x Ga 1-x As,InAs y P 1-y , and In x Ga 1-x As y P 1-y ).
K. Kajiyama, S. Sakata, Y. Mizushima
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CESIUM-GaAs SCHOTTKY BARRIER HEIGHT
Applied Physics Letters, 1967The Schottky barrier height at the interface of cesium metal and vacuum-cleaved p-type GaAs has been found to be 0.63 ± 0.03 eV. These measurements were made photovoltaically at 80°K and indicate that a heavy coverage of cesium leaves the surface roughly intrinsic.
John J. Uebbing, Ronald L. Bell
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Metal/n-GaP Schottky barrier heights
Solid-State Electronics, 1979Abstract A systematic study, which aims to extend the existing metal/n-Gap Schottky barrier height data, is made. Schottky diodes of various barriers, which included Pt/n-GaP, Au/n-GaP, Ni/n-GaP, Mo/n-Gap, Al/n-GaP, Cr/n-GaP, Ag/n-GaP and Cu/n-GaP, were fabricated and their I-V and C-V characteristics were measured.
Tan F. Lei, Chung L. Lee, Chun Y. Chang
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