Epitaxial growth forms III–V membranes directly atop the silicon waveguide layer on SOI, while in‐plane in situ doping defines lateral p–i–n InP/InGaAs junctions in a single growth step. The membrane photodetectors achieve 50 Gb/s NRZ‐OOK operation.
Zhao Yan +10 more
wiley +1 more source
Epitaxy of ultrathin Fe<sub>3</sub>O<sub>4</sub> films on SrTiO<sub>3</sub>(001): influence of growth parameters on the formation of coexisting (111)- and (001)-oriented phases. [PDF]
Alexander A +10 more
europepmc +1 more source
Electrochemical Investigation of Alumina Thin Films for Electronic Packaging
Surface morphology of alumina films on copper substrates produced by ALD. Characterization of the alumina film properties by FTIRR (left) and EIS (right). ABSTRACT Thin films of alumina processed by atomic layer deposition (ALD) were electrochemically investigated by impedance spectroscopy (EIS) and linear sweep voltammetry (LSV) as well as material ...
M. Schneider +4 more
wiley +1 more source
Review of the Gate Structure for Normally Off p-GaN High-Electron-Mobility Transistors Towards High Performances. [PDF]
Pu T, Li X, Li L, Ao JP.
europepmc +1 more source
Photovoltaic Effect in a III‐IV‐V Compound Semiconductor
A large reduction of the GaAs band gap is obtained with incorporation of 6.5% Ge during epitaxy without introducing extended defects or composition inhomogeneity. Heterojunction solar cell devices were fabricated with 0.76‐V open circuit voltage and an internal quantum efficiency above 40% at energies below the bandgap of the GaAs emitter.
José M. Ripalda +13 more
wiley +1 more source
Superconductivity and suppressed monoclinic distortion in FeTe films enabled by higher-order epitaxy. [PDF]
Sato Y +13 more
europepmc +1 more source
Two‐step annealing process drives high thermoelectric performance of n‐type Bi2Te3 flexible films
To address the relatively low carrier mobility in n‐type Bi2Te3 films prepared by magnetron sputtering, we developed a two‐step annealing process, including in situ and post‐annealing heat treatment. This method yields a high mobility (132.54 cm2 V−1 s−1) and S2σ (14.5 μW cm−1 K−2) by promoting pronounced grain growth and strengthening the preferred ...
Liang‐Cao Yin +11 more
wiley +1 more source
Optimization and Simulation on Gas Flow and Temperature Fields on the Homoepitaxial Growth of N-Doped 4H-SiC Wafers. [PDF]
Zhang G, Li T, Liu Y, Sun J, Zhang S.
europepmc +1 more source
Low Temperature Site‐Specific Pulsed Laser Annealing of MoS2
The application of laser pulses, of extremely short duration, is investigated as a potential new method to modify the atomic structure of ultrathin 2D materials for use in the creation of future electrical devices. The process is efficient, offering a site‐specific functionality, where regions of an electronic device that only requires annealing is ...
Nazar Farid +13 more
wiley +1 more source
Controllable Growth of Ordered In-Plane Ge Hut Wires on Trench-Patterned Si Substrate. [PDF]
Gao F, Ming M, Zhang JY, Zhang JJ.
europepmc +1 more source

