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Modelling the ON-state gate leakage current in p-GaN gated AlGaN/GaN HEMTs

open access: yesMicroelectronic Engineering
S. Milazzo   +6 more
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High power density gallium nitride radio frequency transistors via enhanced nucleation in heteroepitaxy. [PDF]

open access: yesNat Commun
Zhou H   +25 more
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Gate Reliability of p-GaN Gate AlGaN/GaN High Electron Mobility Transistors

IEEE Electron Device Letters, 2019
The gate reliability of p-GaN gate AlGaN/GaN high electron mobility transistors with a ring-gate structure is investigated by step-stress experiments under a gate bias, combined with electroluminescence imaging and pulsed measurements. For gate stress ( ${V} _{\text {Gstress}}$ ) from 0 to 13 V, the drain current is found to be stable and decreases
Carlo de Santi   +2 more
exaly   +4 more sources

Gate Reliability of p-GaN HEMT With Gate Metal Retraction

IEEE Transactions on Electron Devices, 2019
In this article, we present an analysis of the gate degradation induced by long-term forward gate stress in GaN-based power HEMTs with p-type gate, controlled by a Schottky metal-retracted/p-GaN junction. In particular, time-dependent gate breakdown and threshold voltage instability are investigated as function of different geometries, gate biases, and
A. N. Tallarico   +6 more
openaire   +2 more sources

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