Modelling the ON-state gate leakage current in p-GaN gated AlGaN/GaN HEMTs
S. Milazzo +6 more
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High power density gallium nitride radio frequency transistors via enhanced nucleation in heteroepitaxy. [PDF]
Zhou H +25 more
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Effects of Switching on the 2-DEG Channel in Commercial E-Mode GaN-on-Si HEMT. [PDF]
Baca-Arroyo R.
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Image super-resolution method using a generative adversarial network incorporating attention and residual density. [PDF]
Zhang Q, Hang Y, Zhang H, Lu X, Qiu J.
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MedGAN-SSM: Multimodal brain image synthesis network integration using SSM empowered GAN. [PDF]
Song T +5 more
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Influence of LPCVD-Si<sub>3</sub>N<sub>4</sub> Thickness on Polarization Coulomb Field Scattering in AlGaN/GaN Metal-Insulator-Semiconductor High-Electron-Mobility Transistors. [PDF]
Jiang G +8 more
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Localized Electric Field Tailoring to Balance Voltage Reliability, Current Density, and High-Frequency Performance of AlGaN/GaN HEMTs. [PDF]
Wang Y +6 more
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Degradation and Damage Effects in GaN HEMTs Induced by Low-Duty-Cycle High-Power Microwave Pulses. [PDF]
Xing D, Liu H, Su M, Liu X, Liu C.
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Gate Reliability of p-GaN Gate AlGaN/GaN High Electron Mobility Transistors
IEEE Electron Device Letters, 2019The gate reliability of p-GaN gate AlGaN/GaN high electron mobility transistors with a ring-gate structure is investigated by step-stress experiments under a gate bias, combined with electroluminescence imaging and pulsed measurements. For gate stress ( ${V} _{\text {Gstress}}$ ) from 0 to 13 V, the drain current is found to be stable and decreases
Carlo de Santi +2 more
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Gate Reliability of p-GaN HEMT With Gate Metal Retraction
IEEE Transactions on Electron Devices, 2019In this article, we present an analysis of the gate degradation induced by long-term forward gate stress in GaN-based power HEMTs with p-type gate, controlled by a Schottky metal-retracted/p-GaN junction. In particular, time-dependent gate breakdown and threshold voltage instability are investigated as function of different geometries, gate biases, and
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