Results 121 to 130 of about 25,827,177 (224)

Negative Activation Energy of Gate Reliability in Schottky-Gate p-GaN HEMTs: Combined Gate Leakage Current Modeling and Spectral Electroluminescence Investigation

open access: yesIEEE Journal of the Electron Devices Society
For the first time, we use electrical characterization, spectrally-resolved electroluminescence measurements and degradation tests to explain the negative activation energy of gate reliability in power GaN HEMTs with p-GaN Schottky gate.
Manuel Fregolent   +14 more
doaj   +1 more source

Enhanced high electron mobility transistor featuring a lattice matched AlInGaN/GaN heterojunction and composite gate structure

open access: yesAIP Advances
This study introduces an enhanced high electron mobility transistor with a lattice-matched AlInGaN/GaN heterojunction and a composite gate structure (CGS). The CGS comprises a recessed gate and a P-type cap layer gate.
Kai Niu   +9 more
doaj   +1 more source

Influence of p-GaN gate airgap in p-GaN AlGaN/GaN HEMTs for improved DC performance

open access: yes
Abstract This study proposes a novel p-GaN AlGaN/GaN high-electron-mobility transistor (HEMT) structure incorporating a gate airgap to address gate leakage and high electric field issues. Comprehensive device simulations conducted using COMSOL Multiphysics show that the airgap-integrated design enhances the breakdown voltage by 47.7% and ...
Muhaimin Haziq   +3 more
openaire   +1 more source

Device Simulation of P-InAlN-Gate AlGaN/GaN High Electron Mobility Transistor

open access: yes, 2020
We simulate a p-InAlN gate AlGaN/GaN high electron mobility transistor (HEM). The studied HEMT is operated at an enhancement mode (e-mode) with positive threshold voltage and low gate leakage current at high gate voltage.
Han-Tung Chang   +4 more
core  

MOCVD-Grown AlGaN/AlN/GaN HEMT Structure with High Mobility GaN Thin Layer as Channel on SiC

open access: yes, 2006
AlGaN/AlN/GaN high electron mobility transistor (HEMT) structures with a high-mobility GaN thin layer as a channel are grown on high resistive 6H-SiC substrates by metalorganic chemical vapor deposition.
Li Jianping   +11 more
core  

Achieving low ON-resistance in E-mode regrown U-shaped p-GaN gate multi-channel HEMT

open access: yes
This work demonstrates an E-mode regrown U-shaped p-GaN gate multi-channel HEMT on a sapphire substrate. The multi-channel access region is favorable to reducing the ON-resistance (RON).
Jiawei Cui   +11 more
core   +1 more source

High-Efficiency Sub-100 nm Gate GaN HEMTs Enabled by Two-Step SiN<sub>x</sub> Layer Etching Technique. [PDF]

open access: yesMicromachines (Basel)
Cao X   +13 more
europepmc   +1 more source

Monolithically integrating polarization-doped InGaN p-FET and GaN n-FET for complementary logic circuitry. [PDF]

open access: yesSci Adv
Yu J   +12 more
europepmc   +1 more source

Atomically confined insertion for 2D strain and polarization engineered GaN electronics. [PDF]

open access: yesNat Commun
Shi Y   +13 more
europepmc   +1 more source

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