Results 51 to 60 of about 2,431 (179)
Gate Reliability of p-GaN Power HEMTs Under Pulsed Stress Condition
A combined experimental/simulation analysis has been performed to study the gate reliability of GaN-HEMTs with p-type gate under pulse stress conditions. Results show that the time-dependent gate breakdown (TDGB) can be determined by two factors: i) the total ON-time during which the device is subjected to a positive gate bias before the failure; ii ...
Millesimo M. +7 more
openaire +1 more source
Suppression of hot electron effect in AlGaN/GaN HEMT with multi-grooves barrier-etched structure
A multi-grooves barrier-etched structure between barrier layer and passivation layer is proposed in this paper to suppress the hot electron effect at the gate edge on the drain side in the p-GaN gate AlGaN/GaN high-electron-mobility transistor.
Xuanlin Li, Jie Xu, Weijing Liu
doaj +1 more source
We have established that a design strategy for drain and gate connected field plates should be adopted while keeping in mind the interplay of various charge sources across AlGaN/GaN epi-stack, which governs the electric field distribution across HEMT ...
Ankit Soni, Mayank Shrivastava
doaj +1 more source
In this study, p-GaN/AlGaN/GaN high electron mobility transistors (HEMTs) with indium–tin–oxide (ITO) gate electrodes are demonstrated. The DC measurements for the devices show a drain current ( $\text{I}_{\mathrm{ D}}$ ) of 438 mA/mm at a
Chih-Yao Chang +7 more
doaj +1 more source
This study presents an analysis of an AlGaN/GaN high-electron-mobility transistor (HEMT) with a triple-trench structure (TT-HEMT) for the enhancement of breakdown voltage, which is often limited by the high electric field near the gate edge. Using COMSOL
Muhaimin Haziq +3 more
doaj +1 more source
A novel AlGaN/GaN Super Heterojunction Field Effect Transistors (super HFET) with dual-polarization junction (DPJ) on the back-barrier layer and its working mechanism is studied. DPJ AlGaN/GaN super HEMT has two polarization junctions with an interval of
Xiuyang Tan +8 more
doaj +1 more source
Exceptional Gate Overvoltage Robustness in P-Gate GaN HEMT with Integrated Circuit Interface [PDF]
The narrow gate overvoltage margin of classical enhancement-mode p-gate GaN high electron mobility transistors (HEMT). is a major concern in both soft and hard switching applications.
Wang, Bixuan +7 more
core +1 more source
Low Insertion‐Loss High Power X‐Band SPDT Transmit/Receive Switches in 250 nm GaN HEMT
ABSTRACT We present three X‐band transmit/receive (T/R) switches utilizing single‐pole double‐throw (SPDT) structures in 250 nm GaN HEMT technology. The first T/R switch was designed to achieve low insertion loss by constructing the SPDT structure with a series λ/4 transmission line (T‐line) and meticulously selected two HEMT switches in parallel for ...
Tae‐Hoon Kim +3 more
wiley +1 more source
In this paper, a novel AlGaN/GaN HEMT structure with a P-GaN buried layer in the buffer layer and a locally doped barrier layer under the gate (PN-HEMT) is proposed to enhance its resistance to single event transient (SET) effects while also overcoming ...
Juan Xiong +4 more
doaj +1 more source
We report on the implementation of dynamic body-bias technique to improve the performance of AlGaN/GaN high electron mobility transistors (HEMTs) with the successful integration of body-diode.
Isra Mahaboob +5 more
doaj +1 more source

