Results 41 to 50 of about 29,855,390 (205)
Gate-Bias Induced RON Instability in p-GaN Power HEMTs
In this letter, we investigate the on-resistance ( RON ) instability in p-GaN power HEMTs induced by a positive or negative gate bias ( VGB ), following the application of a quasi-static initialization voltage ( VGP ) of opposite sign. The transient behavior of this instability was characterized at different temperatures in the 90–135 °C range.
Chini, Alessandro +7 more
openaire +2 more sources
AlN/GaN-based MOS-HEMT technology: processing and device results [PDF]
Process development of AlN/GaN MOS-HEMTs is presented, along with issues and problems concerning the fabrication processes. The developed technology uses thermally grown Al<sub>2</sub>O<sub>3</sub> as a gate dielectric and surface
Wasige, E. +5 more
core +1 more source
Design Optimization of a New Nanostructured P-GaN Gate for Normally-off GaN HEMTs
Best Paper AwardInternational audienceA new AlGaN/GaN heterostructure is proposed to achieve a normally-off behavior for GaN HEMTs. It relies on multiple P-GaN wells epitaxial regrowth along the gate.
Patrick Austin +11 more
core +1 more source
In high-frequency power electronics applications, gallium nitride high electron mobility transistors (GaN HEMTs) can switch at frequencies of several megahertz.
Zhixuan Wang +3 more
doaj +1 more source
The surface morphology optimization of ohmic contacts and the Mg out-diffusion suppression of normally off p-GaN gate high-electron-mobility transistors (HEMTs) continue to be challenges in the power electronics industry in terms of the high-frequency ...
Hsien-Chin Chiu +6 more
doaj +1 more source
Threshold voltage instability by charge trapping effects in the gate region of p-GaN HEMTs [PDF]
In this work, the threshold voltage instability of normally-off p-GaN high electron mobility transistors (HEMTs) has been investigated by monitoring the gate current density during device on-state.
Alessandrino, Mario Santi +17 more
core +1 more source
In this study, we investigate the degradation characteristics of E-mode GaN High Electron Mobility Transistors (HEMTs) with a p-GaN gate by designed pulsed and prolonged negative gate (VGS) bias stress.
Surya Elangovan +2 more
doaj +1 more source
Developing of normally-off p-GaN gate HEMT
Abstract In this paper, the high electron mobility transistor (HEMT) with p-GaN gate is developed. The article demonstrates development of normally-off p-GaN gate HEMT on heterostructure with AlN stop layer for p-GaN selective etching and formation of normally-on GaN HEMT on the same wafer.
O B Kukhtyaeva +7 more
openaire +1 more source
Role of the AlGaN barrier on the long-term gate reliability of power HEMTs with p-GaN gate [PDF]
Forward gate constant voltage stress (CVS) has been performed on GaN-on-Si (200 mm) HEMTs with p-GaN gate, controlled by a Schottky metal-retracted/p-GaN junction, processed by imec with different gate process splits.
Sangiorgi, E. +22 more
core +2 more sources
Investigation on Single and Split Output Gate Configurations Influence on the GaN-HEMTs Switching Behaviours [PDF]
This work investigates the power GaN-HEMTs switching behaviour differences resulted from usage of two gate driving configurations: single and split outputs. The analysis based on simulation and experimental results show that GaN-HEMTs could switch slower
Marsic, Vlad +6 more
core +1 more source

