Results 101 to 110 of about 95,287 (194)

Effect of Process Temperature on Density and Electrical Characteristics of Hf_0.5Zr_0.5O₂ Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition. [PDF]

Nanomaterials (Basel), 2022
Kim HG, Hong DH, Yoo JH, Lee HC.
europepmc   +1 more source

Plasma enhanced atomic layer deposition of zinc sulfide thin films [PDF]

, 2017
Detavernier, Christophe, Dobbelaere, Thomas, Hens, Zeger, Kuhs, Jakob   +3 more
core   +1 more source

Modulation of the high mobility two-dimensional electrons in Si/SiGe using atomic-layer-deposited gate dielectric

, 2005
Metal-oxide-semiconductor field-effect transistors (MOSFET's) using atomic-layer-deposited (ALD) Al$_2$O$_3$ as the gate dielectric are fabricated on the Si/Si$_{1-x}$Ge$_x$ heterostructures.
Lai, K., Lyon, S. A., Muhlberger, M., Pan, W., Schaffler, F., Tsui, D. C., Ye, P. D.   +6 more
core   +1 more source

Pressure-dependent transition from atoms to nanoparticles in magnetron sputtering: Effect on WSi2 film roughness and stress

, 2010
We report on the transition between two regimes from several-atom clusters to much larger nanoparticles in Ar magnetron sputter deposition of WSi2, and the effect of nanoparticles on the properties of amorphous thin films and multilayers.
A. L. Barabasi, Albert T. Macrander, Bing Shi, Hua Zhou, Kimberly MacArthur, L. B. Freund, Lan Zhou, Minghao Li, R. M. German, Randall L. Headrick, Ray Conley, Yiping Wang   +11 more
core   +1 more source

Superhigh energy storage density on-chip capacitors with ferroelectric Hf_0.5Zr_0.5O₂/antiferroelectric Hf_0.25Zr_0.75O₂ bilayer nanofilms fabricated by plasma-enhanced atomic layer deposition. [PDF]

Nanoscale Adv, 2022
He Y, Zheng G, Wu X, Liu WJ, Zhang DW, Ding SJ.   +5 more
europepmc   +1 more source

Highly Homogeneous Current Transport in Ultra-Thin Aluminum Nitride (AlN) Epitaxial Films on Gallium Nitride (GaN) Deposited by Plasma Enhanced Atomic Layer Deposition. [PDF]

Nanomaterials (Basel), 2021
Schilirò E, Giannazzo F, Di Franco S, Greco G, Fiorenza P, Roccaforte F, Prystawko P, Kruszewski P, Leszczynski M, Cora I, Pécz B, Fogarassy Z, Lo Nigro R.   +12 more
europepmc   +1 more source

Temperature-Dependent Growth Mechanisms and Optical Properties of MgF₂ Thin Films Synthesized by Plasma-Enhanced Atomic Layer Deposition

Chemistry
MgF2 films are prepared using plasma-enhanced atomic layer deposition (PEALD). The influence of substrate temperature on the growth behavior, chemical composition, and optical properties of MgF2 films is systematically investigated.
Shui-Yang Lien, Xiao Lin, Zhi-Xuan Zhang, Jing Zhang, Wen-Xuan Zhu, Chia-Hsun Hsu, Chen Wang   +6 more
doaj   +1 more source

High mobility In2O3 thin films grown by atomic layer deposition using a microwave remote plasma source for field-effect transistor applications

Applied Physics Express
In this study, we established a microwave remote plasma source (MW-RPS) to perform plasma-enhanced atomic layer deposition to grow an In _2 O _3 channel for FET applications.
Yuto Kawato, Takanori Takahashi, Toshihiro Tamai, Shunichi Mikami, Yukiharu Uraoka   +4 more
doaj   +1 more source

Field Emission from Carbon Nanotubes on Titanium Nitride-Coated Planar and 3D-Printed Substrates

Nanomaterials
Carbon nanotubes (CNTs) are well known for their outstanding field emission (FE) performance, facilitated by their unique combination of electrical, mechanical, and thermal properties. However, if the substrate of choice is a poor conductor, the electron
Stefanie Haugg, Luis-Felipe Mochalski, Carina Hedrich, Isabel González Díaz-Palacio, Kristian Deneke, Robert Zierold, Robert H. Blick   +6 more
doaj   +1 more source

Author Correction: Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry. [PDF]

Sci Rep, 2021
Kilic U, Mock A, Sekora D, Gilbert S, Valloppilly S, Melendez G, Ianno N, Langell M, Schubert E, Schubert M.   +9 more
europepmc   +1 more source