Results 261 to 270 of about 5,812,653 (293)

Plasma Enhanced Atomic Layer Deposited Ru for MIMCAP Applications

ECS Meeting Abstracts, 2011
Abstract not Available.
Johan Swerts, M.M. Salimullah, M. Popovici, M.-S. Kim, M.A. Pawlak, A. Delabie, M. Schaekers, K. Tomida, B. Kaczer, K. Opsomer, C. Vrancken, I Debusschere, L. Altimime, J.A. Kittl, S. Van Elshocht   +14 more
openaire   +1 more source

Plasma Enhanced Atomic Layer Deposition of TaN Thin Films

ECS Meeting Abstracts, 2010
Abstract not Available.
Paul Ma, Jiang Lu
openaire   +1 more source

Plasma enhanced atomic layer deposition of copper: A comparison of precursors

Surface and Coatings Technology, 2013
Abstract The growth of Cu films by atomic layer deposition using hydrogen plasma has been investigated. To obtain continuous films at sub 5 nm thicknesses the two dimensional coalescence of Cu nucleation sites formed at the start of the deposition process must be enhanced in preference to three dimensional island growth.
D.J. Hagen, J. Connolly, R. Nagle, I.M. Povey, S. Rushworth, P. Carolan, P. Ma, M.E. Pemble   +7 more
openaire   +1 more source

Plasma-enhanced atomic layer deposition of superconducting niobium nitride

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2016
Thin films of niobium nitride are useful for their physical, chemical, and electrical properties. NbN superconducting properties have been utilized in a wide range of applications. Plasma-enhanced atomic layer deposition (PEALD) of NbN with (t-butylimido) tris(diethylamido) niobium(V) and remote H2/N2 plasmas has been investigated.
Mark J. Sowa, Yonas Yemane, Jinsong Zhang, Johanna C. Palmstrom, Ling Ju, Nicholas C. Strandwitz, Fritz B. Prinz, J. Provine   +7 more
openaire   +1 more source

Plasma-enhanced atomic layer deposition of Co on metal surfaces

Surface and Coatings Technology, 2015
Abstract Co thin films were deposited using plasma-enhanced atomic layer deposition (PE-ALD) on various substrates such as Ru, Ta, SiO2, and Si. The growth characteristics of PE-ALD Co were investigated on the basis of their magnetic and electrical properties analyzed using a vibrating sample magnetometer (VSM) and four-point probe system ...
Jaehong Yoon, Jeong-Gyu Song, Hyungjun Kim, Han-Bo-Ram Lee   +3 more
openaire   +1 more source

Plasma enhanced atomic layer deposition of Ga

Journal of Materials Chemistry A, 2014
Ranjith K. Ramachandran, Jolien Dendooven, Jonas Botterman, Sreeprasanth Pulinthanathu Sree, Dirk Poelman, Johan A. Martens, Hilde Poelman, Christophe Detavernier   +7 more
openaire   +1 more source

Growth of TiO2 with thermal and plasma enhanced atomic layer deposition.

Journal of nanoscience and nanotechnology, 2011
We show a comparative study of the TiO2 ALD with TTIP and either O2 or O2-plasma on Si/SiO2 substrates. In particular we compare the surface morphology and crystalline phase by means of Atomic Force Microscopy (AFM), X-ray Photoelectron Spectroscopy (XPS) and X-ray Absorption Spectroscopy (XAS) for different O2-plasma procedures upon changing the time ...
Massimo, Tallarida, Daniel, Friedrich, Matthias, Städter, Marcel, Michling, Dieter, Schmeisser   +4 more
openaire   +1 more source

Effect of atomic layer annealing in plasma-enhanced atomic layer deposition of aluminum nitride on silicon Open Access

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 2023
Christoffer Kauppinen, Sami Suihkonen, Heli Seppänen   +2 more
exaly  

Low-temperature growth of gallium oxide thin films by plasma-enhanced atomic layer deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 2020
Ali Mahmoodinezhad, Karsten Henkel, Paul Plate   +2 more
exaly  

Plasma-enhanced atomic layer deposition of SiO2 film using capacitively coupled Ar/O2 plasmas: A computational investigation Available to Purchase

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 2021
Mark Kushner, Chenhui Qu
exaly