Results 11 to 20 of about 733 (170)
An AlInN/GaN superjunction fin‐gate high electron mobility transistor (SJFin‐HEMT) is proposed in this work. A superjunction region with GaN/AlInN/GaN/AlInN/GaN structure is defined between the gate and drain, and two‐dimensional‐hole‐gas/two‐dimensional‐
Weijun Zhou +9 more
doaj +2 more sources
A simple and accurate analytical model for the estimation of switching losses on power MOSFETs is proposed. It consists of simplifying the non‐linear behaviour of Miller capacitance as a function of voltage.
Edemar O. Prado +3 more
doaj +2 more sources
Theory of Superjunction Devices [PDF]
Since the first ideal specific resistance model by Fujihira in 1997 and the first commercial superjunction MOSFET by Infineon technology in 1998, the technology and the understanding of superjunction devices have been gradually progressed. Although Fujihira’s ideal model was developed to estimate the specific on-state resistance at a given cell pitch ...
openaire +4 more sources
Machine Learning-Based Figure of Merit Model of SIPOS Modulated Drift Region for U-MOSFET. [PDF]
This paper presents a machine learning-based figure of merit model for superjunction (SJ) U-MOSFET (SSJ-UMOS) with a modulated drift region utilizing semi-insulating poly-crystalline silicon (SIPOS) pillars.
Cao Z, Sun Q, Ma C, Hou B, Jiao L.
europepmc +2 more sources
Study of High-Performance GaN-Based Trench CAVET with Stepped Doping Microstructure. [PDF]
In this article, an innovative GaN-based trench current-aperture vertical electron transistor (CAVET) with a stepped doping microstructure is proposed and studied using Silvaco-ATLAS.
Li Y, Xu L, Guo Z, Sun H.
europepmc +2 more sources
Gate Ringing in Superjunction MOSFETs with a Parasitic Capacitance in the Load Inductor
In this paper, the origin of the gate oscillations with a stray capacitance in the load inductor is analyzed with a device/circuit mix-mode simulation. It is found that the gate ringing occurs when the superjunction device reaches its pinch-off potential
Florin Udrea, Hyemin Kang
exaly +3 more sources
In this report, the advanced manufacturing advantages of using supersaturated chlorinated chemistry are demonstrated at 1550 °C in 4H‐silicon carbide (4H‐SiC) epitaxy on trenches with different geometric profiles. Sloped mesa sidewalls (8°) show improved
Kelly Turner +8 more
doaj +2 more sources
Gallium oxide (Ga<sub>2</sub>O<sub>3</sub>) heterogeneous and heterojunction power devices. [PDF]
Due to its high critical breakdown electrical field and the availability of large-scale single crystal substrates, Gallium oxide (Ga2O3) holds great promise for power electronic and radio frequency (RF) applications.
Li B +9 more
europepmc +2 more sources
Analog/RF and Distortion Characteristics of Recessed Superjunction AlGaN/GaN HEMTs
In this work, we investigate the impact of the recessed height of the i-gallium nitride (GaN) layer on the performance of superjunction AlGaN/GaN high electron mobility transistors (HEMTs).
Nahida Banu +2 more
doaj +2 more sources
In this paper, performance at 1st and 3rd quadrant operation of Silicon and Silicon Carbide (SiC) symmetrical and asymmetrical double-trench, superjunction and planar power MOSFETs is analysed through a wide range of experimental measurements using ...
Juefei Yang +5 more
doaj +1 more source

